Search Results - "Chia Wen Liang"

A Data-Driven Approach for Identifying Possible Manufacturing Processes and Production Parameters That Cause Product Defects: A Thin-Film Filter Company Case Study by Lyu, Jrjung, Liang, Chia Wen, Chen, Ping-Shun

“…A semiconductor or photoelectric manufacturer faces a more competitive market with small quantities of many products. These products require hundreds of…”
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Quasi-planar bulk CMOS technology for improved SRAM scalability by Shin, Changhwan, Tsai, Chen Hua, Wu, Mei Hsuan, Chang, Chung Fu, Liu, You Ren, Kao, Chih Yang, Lin, Guan Shyan, Chiu, Kai Ling, Fu, Chuan-Shian, Tsai, Cheng-tzung, Liang, Chia Wen, Nikolić, Borivoje, Liu, Tsu-Jae King

“…A simple approach for manufacturing quasi-planar bulk MOSFET structures is demonstrated and shown to be effective not only for improving device performance but…”
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Microcrystallinity of undoped amorphous silicon films and its effects on the transfer characteristics of thin-film transistors by LIANG, C.-W, CHIANG, W.-C, FENG, M.-S

“…The microcrystallinity of hydrogenated amorphous silicon films deposited by the conventional radio-frequency plasma-enhanced chemical vapor deposition…”
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Tri-gate bulk CMOS technology for improved SRAM scalability by Changhwan Shin, Nikolić, Borivoje, Tsu-Jae King Liu, Chen Hua Tsai, Mei Hsuan Wu, Chung Fu Chang, You Ren Liu, Chih Yang Kao, Guan Shyan Lin, Kai Ling Chiu, Chuan-Shian Fu, Cheng-tzung Tsai, Chia Wen Liang

“…A simple approach for manufacturing quasi-planar tri-gate bulk MOSFET structures is demonstrated and shown to be effective for reducing variation in 6T-SRAM…”
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Impact of impedance-dependent receiver gain on the extracted channel thermal noise in sub-100 nm MOSFETs by Chen, Chih-Hung, Lei, Peiming, Liang, Chia Wen

“…To continue the pursuit of Moore’s law, process variations become a very crucial aspect in fabrications, characterization, and modeling for devices with…”
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New Negative-Bias-Temperature-Instability Improvement Using Buffer Layer under Highly Compressive Contact Etch Stop Layer for 45-nm-Node Complementary Metal–Oxide–Semiconductor and Beyond by Huang, Cheng-Tung, Lee, Kun-Hsien, Jeng, Li-Shian, Hung, Wen-Han, Ting, Shyh-Fann, Wu, Meng-Yi, Tseng, Mei-Lun, Cheng, Osbert, Liang, Chia-Wen

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Overcome the challenges of 45-nm design by Liang, Chia Wen

“…Defect issues: New fabrication techniques often result in defect issues. As an example, consider how UMC's fabrication of working 45-nm SRAM identified…”
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Microcrystallinity of undoped amorphous silicon films and its effects on the transfer characteristics of thin film transistors by Chia-Wen Liang, Wen-Chuan Chiang, Ming-Shiann Feng

“…The microcrystallinity of the hydrogenated amorphous silicon films deposited by the usual radio-frequency plasma-enhanced chemical vapor deposition (rf-PECVD)…”
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