Search Results - "Chao-Hsin Chien"
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Conformal bilayer h-AlN epitaxy on WS2 by ALD with ultralow leakage current
Published in Applied physics letters (16-10-2023)“…In this work, we develop an ultrathin epitaxial h-AlN as an interfacial layer (IL) between HfO2 and monolayer WS2 channel by atomic layer deposition (ALD). The…”
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Wafer-scale MOCVD grown WS2 with normally off transistor behavior and its general application on different amorphous substrates
Published in Applied physics letters (30-10-2023)“…In this study, we investigated various approaches to manipulate the flake density, size, and thickness of two-dimensional transition metal dichalcogenides by…”
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Effect of Yttrium Treatment on Germanium-Oxide-Based Interfacial Layer of Ge P-Channel Metal-Oxide-Semiconductor Field-Effect Transistor Fabricated Through in Situ Plasma-Enhanced Atomic Layer Deposition
Published in IEEE transactions on electron devices (01-03-2024)“…This study investigated the effect of yttrium (Y) treatment on a germanium (Ge)-oxide-based interfacial layer (IL) through in situ plasma-enhanced atomic layer…”
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van der Waals epitaxy of 2D h-AlN on TMDs by atomic layer deposition at 250 °C
Published in Applied physics letters (18-04-2022)“…We report the demonstration of growing two-dimensional (2D) hexagonal-AlN (h-AlN) on transition metal dichalcogenide (TMD) monolayers (MoS2, WS2, and WSe2) via…”
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5
Improving Thermal Stability for Ge p-MOSFET of HfO2-Based Gate Stack With Ti-Doped Into Interfacial Layer by In-Situ Plasma-Enhanced Atomic Layer Deposition
Published in IEEE electron device letters (01-08-2021)“…We successfully fabricated a Ge pMOSFET with Ti that is doped into a GeO x interfacial layer (IL) of HfO 2 -based gate stacks, doing so using in situ…”
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GaN-based mini-LED matrix applied to multi-functional forward lighting
Published in Scientific reports (19-04-2022)“…In this paper, we propose and demonstrate to use of a single reflector with 68 segments to project vehicle low beam and high beam with the use of a GaN-based…”
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Impact of High-Temperature Annealing on Interfacial Layers Grown by O2 Plasma on Si0.5Ge0.5 Substrates
Published in IEEE transactions on electron devices (01-03-2022)“…This article demonstrates the influence of high-temperature annealing on an interfacial layer (IL) grown by O 2 plasma on Si 0.5 Ge 0.5 substrates. The X-ray…”
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Comprehensive Study of Contact Length Scaling Down to 12 nm With Monolayer MoS2 Channel Transistors
Published in IEEE transactions on electron devices (01-12-2023)“…The 2-D transition metal dichalcogenides (2-D TMDs) have emerged as a promising channel material for postsilicon applications for their ultrathin structure and…”
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Enhancing the Thermal Stability of GaSb Schottky-Barrier MOSFET With Pt Source/Drain
Published in IEEE electron device letters (01-07-2018)“…In this study, a Pt/GaSb Schottky diode with impressive rectifying behavior is used for the first time in the fabrication of a GaSb p-channel Schottky-barrier…”
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Neuro-Inspired-in-Memory Computing Using Charge-Trapping MemTransistor on Germanium as Synaptic Device
Published in IEEE transactions on electron devices (01-09-2020)“…In this work, we fabricated charge-trapping MemTransistors (CTMTs) on a germanium (Ge) substrate with a single-charge-trapping-layer gate-stack or a…”
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Experimentally Determining the Top and Edge Contact Resistivities of Two-Step Sulfurization Nb-Doped MoS2 Films Using the Transmission Line Measurement
Published in IEEE electron device letters (01-10-2019)“…This study determined the top (vertical) and edge (horizontal) resistivities of metal-MoS 2 contact based on the experimental results obtained using the…”
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12
Highly Transparent, High-Performance IGZO-TFTs Using the Selective Formation of IGZO Source and Drain Electrodes
Published in IEEE electron device letters (01-06-2014)“…In this letter, high-performance, highly transparent amorphous InGaZnO (IGZO) thin-film transistors (TFTs) with IGZO source/drain electrodes were fabricated…”
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13
Improving Interface State Density and Thermal Stability of High- \kappa Gate Stack Through High-Vacuum Annealing on Si0.5Ge0.5
Published in IEEE electron device letters (01-05-2019)“…We fabricated HfO 2 -based gate stacks on epi-Si 0.5 Ge 0.5 substrates and investigated the effect of thermal treatment on their structural and electrical…”
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14
Effect of Oxygen Treatment on the Electrical Performance and Reliability of IWO Thin-Film Transistors
Published in IEEE transactions on nanotechnology (2024)“…In this work, we systematically investigated the effect of oxygen treatment on the material and electrical properties of Indium-Tungsten-Oxide thin film…”
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15
Sinter-free transferring of anodized TiO2 nanotube-array onto a flexible and transparent sheet for dye-sensitized solar cells
Published in Electrochimica acta (28-02-2013)“…[Display omitted] ► A sinter-free method to transfer TiO2 nanotube onto plastic sheet was proposed. ► Transparent conductive oxide on nanotubes exhibited…”
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Demonstration of HfO2-Based Gate Dielectric With Low Interface State Density and Sub-nm EOT on Ge by Incorporating Ti Into Interfacial Layer
Published in IEEE electron device letters (01-02-2019)“…HfO 2 -based gate stacks with titanium (Ti) incorporated into a GeO x interfacial layer (IL) were fabricated on p-Ge substrates. X-ray photoelectron…”
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17
Self‐Aligned Contact Doping for Performance Enhancement of Low‐Leakage Carbon Nanotube Field Effect Transistors
Published in Advanced electronic materials (01-03-2024)“…Carbon nanotube (CNT) field effect transistors (CNFETs) show promise for the next generation VLSI systems due to their excellent scalability, energy…”
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Low-Leakage Tetragonal ZrO2 (EOT < 1 nm) With In Situ Plasma Interfacial Passivation on Germanium
Published in IEEE electron device letters (01-02-2016)“…We successfully fabricated gate stacks (ZrO2/GeO x /Ge) with a subnanometer equivalent oxide thickness (EOT) and low-leakage current on n-/p-Ge through…”
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Interface Characterization of HfO2/GaSb MOS Capacitors With Ultrathin Equivalent Oxide Thickness by Using Hydrogen Plasma Treatment
Published in IEEE transactions on electron devices (01-09-2016)“…We investigate p-type GaSb MOS capacitors with various HfO 2 thicknesses grown using an atomic layer deposition. GaSb surfaces treated with ex-situ chemical…”
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First Experimental Demonstration and Mechanism of Abnormal Palladium Diffusion Induced by Excess Interstitial Ge
Published in IEEE electron device letters (01-11-2018)“…This letter represents the first direct experimental demonstrations and mechanism proposal regarding abnormal palladium diffusion into germanium (Ge). Our…”
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