Substrate Silicon Wafer Integrated Fan-out Technology (S-SWIFT®) Packaging with Fine Pitch Embedded Trace RDL
This paper presents an advanced redistribution layer (RDL) technology called embedded trace RDL (ETR) for use in the substrate Silicon Wafer Integrated Fan-out Technology (S-SWIFT ® ) package. S-SWIFT packaging is designed to provide increased input/output (I/O) and circuit density within a reduced...
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Published in: | 2022 IEEE 72nd Electronic Components and Technology Conference (ECTC) pp. 1355 - 1361 |
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Main Authors: | , , , , , |
Format: | Conference Proceeding |
Language: | English |
Published: |
IEEE
01-05-2022
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Subjects: | |
Online Access: | Get full text |
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Summary: | This paper presents an advanced redistribution layer (RDL) technology called embedded trace RDL (ETR) for use in the substrate Silicon Wafer Integrated Fan-out Technology (S-SWIFT ® ) package. S-SWIFT packaging is designed to provide increased input/output (I/O) and circuit density within a reduced footprint and enable high reliability and excellent electrical performance. ETR is created by a novel photolithography technique and a photo-sensitive passivation material with high resolution.Since the process steps of the new ETR are reduced compared to the current process, it can provide a cost effective, multi-layer RDL in a short cycle time using existing infrastructure. ETR possess capabilities of less than 2-μm resolution and multi-layer stacking up to 6 layers. To secure stable processability with high yield, a highly uniform dielectric coating, optimum plating and planarization process were developed. To validate its integrity and reliability, an S-SWIFT package with 4-layers of embedded RDLs with stacked vias was fabricated and JEDEC standard reliability tests were performed. The S-SWIFT package passed the temperature cycling (TC), highly accelerated temperature and humidity stress test (HAST) and the high temperature storage (HTS) testing. |
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ISSN: | 2377-5726 |
DOI: | 10.1109/ECTC51906.2022.00218 |