Search Results - "Cerrina, F."

Sub-50 nm period patterns with EUV interference lithography by Solak, H.H., David, C., Gobrecht, J., Golovkina, V., Cerrina, F., Kim, S.O., Nealey, P.F.

“…We have used transmission diffraction gratings in an interferometric setup to pattern one- and two-dimensional periodic patterns with periods near 50 nm. The…”
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In situ oligonucleotide synthesis on carbon materials: stable substrates for microarray fabrication by Phillips, Margaret F, Lockett, Matthew R, Rodesch, Matthew J, Shortreed, Michael R, Cerrina, Franco, Smith, Lloyd M

“…Glass has become the standard substrate for the preparation of DNA arrays. Typically, glass is modified using silane chemistries to provide an appropriate…”
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Exposure of 38 nm period grating patterns with extreme ultraviolet interferometric lithography by Solak, H. H., He, D., Li, W., Singh-Gasson, S., Cerrina, F., Sohn, B. H., Yang, X. M., Nealey, P.

“…Extreme ultraviolet (EUV, λ=13 nm) lithography is considered to be the most likely technology to follow ultraviolet (optical) lithography. One of the…”
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High performance resist for EUV lithography by Gonsalves, K.E., Thiyagarajan, M., Choi, J.H., Zimmerman, Paul, Cerrina, F., Nealey, P., Golovkina, V., Wallace, J., Batina, Nikola

“…As the semiconductor industry moves to the 32 nm node, it becomes apparent that new lithography technology will be needed. One possibility for fabricating this…”
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Dense arrays of nanopores as x-ray lithography masks by Knaack, S. A., Eddington, J., Leonard, Q., Cerrina, F., Onellion, M.

“…An anodized aluminum oxide nanopore has been used as an x-ray lithography mask to achieve a feature size of ∼35 nm on the polymethylmethacrylate photoresist…”
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Recent Advances in X-Ray Lithography by F. Cerrina, F. Cerrina

“…We report some significant developments in the area of X-ray technology, in the area of the modeling of image formation, in distortion control and in mask…”
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X-ray photo-electron spectromicroscopy by Cerrina, F.

“…We report on the design implementation performances and experience of usage of the X-ray microscope system MAXIMUM. The project that began in 1987 culminated…”
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Oriented crystallization of GaSb on a patterned, amorphous Si substrate by Yi, S. S., Moran, P. D., Zhang, X., Cerrina, F., Carter, J., Smith, H. I., Kuech, T. F.

“…Oriented crystallization of GaSb on patterned, oxidized Si substrates was achieved by metalorganic chemical vapor deposition. The Si substrate was formed by…”
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Progress in gene assembly from a MAS-driven DNA microarray by Kim, C., Kaysen, J., Richmond, K., Rodesch, M., Binkowski, B., Chu, L., Li, M., Heinrich, K., Blair, S., Belshaw, P., Sussman, M., Cerrina, F.

“…We report the progress on 765 bp full green fluorescent protein (GFP) gene assembly of oligonucleotides from a single DNA microarray, using the amplification…”
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Four-wave EUV interference lithography by Solak, H.H., David, C., Gobrecht, J., Wang, L., Cerrina, F.

“…We have developed a multiple beam Extreme Ultraviolet (EUV) interference lithography system to create two-dimensional periodic structures. A spatially coherent…”
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Application of X-rays to nanolithography by Cerrina, F.

“…The development of a successful fabrication process for electron devices with dimensions in the sub-100-nm domain will require a form of a high-resolution and…”
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Hard x-ray phase zone plate fabricated by lithographic techniques by LAI, B, YUN, W. B, DI FABRIZIO, E, GENTILI, M, GRELLA, L, BACIOCCHI, M, LEGNINI, D, XIAO, Y, CHRZAS, J, VICCARO, P. J, WHITE, V, BAJIKAR, S, DENTON, D, CERRINA, F

“…A Fresnel phase zone plate with an unprecedented focusing efficiency of 33% was fabricated using an x-ray lithographic technique and was tested using…”
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High sensitivity nanocomposite resists for EUV lithography by Azam Ali, M, Gonsalves, K.E, Golovkina, V, Cerrina, F

“…A novel nanocomposite photoresist was synthesized for extreme ultraviolet lithography (EUVL) by a radical polymerization process. This resist system exhibited…”
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Biological lithography: development of a maskless microarray synthesizer for DNA chips by Cerrina, F., Blattner, F., Huang, W., Hue, Y., Green, R., Singh-Gasson, S., Sussman, M.

“…We have recently reported the development of a DNA maskless array synthesizer (MAS) [Singh-Gasson et al., Nat. Biotechnol. 17 (1999) 974]. In this paper we…”
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An x-ray spectromicroscopic study of electromigration in patterned Al(Cu) lines by Solak, H. H., Lorusso, G. F., Singh-Gasson, S., Cerrina, F.

“…We studied the surface properties of patterned Al(Cu) lines related to the electromigration phenomena using photoemission spectromicroscopy techniques. We…”
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Image formation in EUV lithography: Multilayer and resist properties by Cerrina, F., Bollepalli, S., Khan, M., Solak, H., Li, W., He, D.

“…We report the results of a modeling study of the image formation process in EUVL. Using a rigorous diffraction scheme, we compute the propagation of the mask…”
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X-ray microdiffraction study of Cu interconnects by Zhang, X., Solak, H., Cerrina, F., Lai, B., Cai, Z., Ilinski, P., Legnini, D., Rodrigues, W.

“…We have used x-ray microdiffraction to study the local structure and strain variation of copper interconnects. Different types of local microstructures have…”
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Extreme Ultraviolet Interferometric Lithography: A Path to Nanopatterning by Cerrina, F., Isoyan, A., Jiang, F., Cheng, Y. C., Leonard, Q., Wallace, J., Heinrich, K., Ho, A., Efremov, M., Nealey, P.

“…The semiconductor industry continues in its relentless march to miniaturization [ 1 ]. Every four years or so, the dimensions of the features on an integrated…”
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Synchrotron radiation micro-Fourier transform infrared spectroscopy applied to photoresist imaging by Ocola, L. E., Cerrina, F., May, Tim

“…The application of a micro-Fourier transform infrared, (μ-FTIR), spectroscopic system, using synchrotron radiation as a light source, for photoresist chemical…”
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Scanning force microscopy measurements of latent image topography in chemically amplified resists by Ocola, L. E., Fryer, D. S., Reynolds, G., Krasnoperova, A., Cerrina, F.

“…Noncontact scanning force microscopy topography measurements of exposed and undeveloped photoresists are reported. A negative chemically amplified photoresist,…”
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