Search Results - "Cavanagh, A. S"
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Al2O3 and TiO2 Atomic Layer Deposition on Copper for Water Corrosion Resistance
Published in ACS applied materials & interfaces (01-12-2011)“…Al2O3 and TiO2 atomic layer deposition (ALD) were employed to develop an ultrathin barrier film on copper to prevent water corrosion. The strategy was to…”
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Growth of continuous and ultrathin platinum films on tungsten adhesion layers using atomic layer deposition techniques
Published in Applied physics letters (10-09-2012)“…Continuous and ultrathin platinum (Pt) films were deposited on tungsten (W) adhesion layers using atomic layer deposition (ALD) techniques. Pt ALD films were…”
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HWCVD MoO3 nanoparticles and a-Si for next generation Li-ion anodes
Published in Thin solid films (02-05-2011)“…We have employed hot wire chemical vapor deposition (HWCVD) for the generation of MoO3 nanostructures at high density. Furthermore, the morphology of the…”
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Molecular Layer Deposition of Alucone Polymer Films Using Trimethylaluminum and Ethylene Glycol
Published in Chemistry of materials (27-05-2008)“…Polymeric films can be grown by a sequential, self-limiting surface chemistry process known as molecular layer deposition (MLD). The MLD reactants are…”
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Tungsten atomic layer deposition on polymers
Published in Thin solid films (31-07-2008)“…Tungsten (W) atomic layer deposition (ALD) was investigated on a variety of polymer films and polymer particles. These polymers included polyethylene,…”
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Unexpected Improved Performance of ALD Coated LiCoO2/Graphite Li-Ion Batteries
Published in Advanced energy materials (01-02-2013)“…The performance of Al2O3 atomic layer deposition (ALD) coatings for LiCoO2/natural graphite (LCO/NG) batteries is investigated, where various permutations of…”
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Molybdenum Atomic Layer Deposition Using MoF6 and Si2H6 as the Reactants
Published in Chemistry of materials (12-04-2011)“…Mo ALD has been demonstrated by fluorosilane elimination chemistry using MoF6 and Si2H6 as the reactants. The nucleation and growth characteristics of Mo ALD…”
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Fe(3)O(4) Nanoparticles Confined in Mesocellular Carbon Foam for High Performance Anode Materials for Lithium-Ion Batteries
Published in Advanced functional materials (28-06-2011)Get full text
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Al 2 O 3 and TiO 2 Atomic Layer Deposition on Copper for Water Corrosion Resistance
Published in ACS applied materials & interfaces (28-12-2011)Get full text
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研究发现特定分子在斑秃患者中增多, 并且可能与个人抑郁程度相关
Published in British journal of dermatology (1951) (01-01-2020)“…Summary 斑秃 (AA) 是一种可导致脱发的常见疾病。约 2% 的人群在其生命中至少遭受一次 AA 的影响。这种疾病通常从一块头发脱发开始,但可能会影响整个头皮或身体。脱发由免疫系统的细胞攻击皮肤中的生发结构引起。不幸的是,60% 的 AA 患者也会出现抑郁、焦虑或相关病症。 本研究来自苏格兰,旨在了解 AA…”
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