Search Results - "Cavanagh, A. S"

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  1. 1

    Al2O3 and TiO2 Atomic Layer Deposition on Copper for Water Corrosion Resistance by Abdulagatov, A. I, Yan, Y, Cooper, J. R, Zhang, Y, Gibbs, Z. M, Cavanagh, A. S, Yang, R. G, Lee, Y. C, George, S. M

    Published in ACS applied materials & interfaces (01-12-2011)
    “…Al2O3 and TiO2 atomic layer deposition (ALD) were employed to develop an ultrathin barrier film on copper to prevent water corrosion. The strategy was to…”
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    Journal Article
  2. 2

    Growth of continuous and ultrathin platinum films on tungsten adhesion layers using atomic layer deposition techniques by Baker, L., Cavanagh, A. S., Yin, J., George, S. M., Kongkanand, A., Wagner, F. T.

    Published in Applied physics letters (10-09-2012)
    “…Continuous and ultrathin platinum (Pt) films were deposited on tungsten (W) adhesion layers using atomic layer deposition (ALD) techniques. Pt ALD films were…”
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    Journal Article
  3. 3

    HWCVD MoO3 nanoparticles and a-Si for next generation Li-ion anodes by DILLON, A. C, RILEY, L. A, JUNG, Y. S, BAN, C, MOLINA, D, MAHAN, A. H, CAVANAGH, A. S, GEORGE, S. M, LEE, S.-H

    Published in Thin solid films (02-05-2011)
    “…We have employed hot wire chemical vapor deposition (HWCVD) for the generation of MoO3 nanostructures at high density. Furthermore, the morphology of the…”
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    Conference Proceeding Journal Article
  4. 4

    Molecular Layer Deposition of Alucone Polymer Films Using Trimethylaluminum and Ethylene Glycol by Dameron, A. A, Seghete, D, Burton, B. B, Davidson, S. D, Cavanagh, A. S, Bertrand, J. A, George, S. M

    Published in Chemistry of materials (27-05-2008)
    “…Polymeric films can be grown by a sequential, self-limiting surface chemistry process known as molecular layer deposition (MLD). The MLD reactants are…”
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    Journal Article
  5. 5

    Tungsten atomic layer deposition on polymers by Wilson, C.A., McCormick, J.A., Cavanagh, A.S., Goldstein, D.N., Weimer, A.W., George, S.M.

    Published in Thin solid films (31-07-2008)
    “…Tungsten (W) atomic layer deposition (ALD) was investigated on a variety of polymer films and polymer particles. These polymers included polyethylene,…”
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    Journal Article
  6. 6

    Unexpected Improved Performance of ALD Coated LiCoO2/Graphite Li-Ion Batteries by Jung, Yoon Seok, Lu, Peng, Cavanagh, Andrew S., Ban, Chunmei, Kim, Gi-Heon, Lee, Se-Hee, George, Steven M., Harris, Stephen J., Dillon, Anne C.

    Published in Advanced energy materials (01-02-2013)
    “…The performance of Al2O3 atomic layer deposition (ALD) coatings for LiCoO2/natural graphite (LCO/NG) batteries is investigated, where various permutations of…”
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    Journal Article
  7. 7

    Molybdenum Atomic Layer Deposition Using MoF6 and Si2H6 as the Reactants by Seghete, D, Rayner, G.B, Cavanagh, A.S, Anderson, V.R, George, S.M

    Published in Chemistry of materials (12-04-2011)
    “…Mo ALD has been demonstrated by fluorosilane elimination chemistry using MoF6 and Si2H6 as the reactants. The nucleation and growth characteristics of Mo ALD…”
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    Journal Article
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    研究发现特定分子在斑秃患者中增多, 并且可能与个人抑郁程度相关 by Bain, K.A., McDonald, E., Moffat, F., Tutino, M., Castelino, M., Barton, A., Cavanagh, J., Ijaz, U.Z., Siebert, S., McInnes, I.B., Astrand, A., Holmes, S., Milling, S.W.F.

    Published in British journal of dermatology (1951) (01-01-2020)
    “…Summary 斑秃 (AA) 是一种可导致脱发的常见疾病。约 2% 的人群在其生命中至少遭受一次 AA 的影响。这种疾病通常从一块头发脱发开始,但可能会影响整个头皮或身体。脱发由免疫系统的细胞攻击皮肤中的生发结构引起。不幸的是,60% 的 AA 患者也会出现抑郁、焦虑或相关病症。 本研究来自苏格兰,旨在了解 AA…”
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    Journal Article