Search Results - "Caristia, L."

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  1. 1

    Quantitative electron energy loss spectroscopy of si nanoclusters embedded in SiOx by NICOTRA, G, BONGIORNO, C, CARISTIA, L, COFFA, S, SPINELLA, C

    Published in Microelectronic engineering (01-03-2007)
    “…We have used a methodology, based on electron energy loss spectroscopy combined with energy filtered images, which allows us to quantify the clustered silicon…”
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    Conference Proceeding Journal Article
  2. 2

    Role of the internal strain on the incomplete Si∕SiO2 phase separation in substoichiometric silicon oxide films by La Magna, A., Nicotra, G., Bongiorno, C., Spinella, C., Grimaldi, M. G., Rimini, E., Caristia, L., Coffa, S.

    Published in Applied physics letters (30-04-2007)
    “…Silicon nanoclusters were formed in plasma-enhanced chemical vapor deposited substoichiometric silicon oxide films by annealing at 1100°C for 1∕2h as a…”
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    Journal Article
  3. 3

    High efficiency light emitting devices in silicon by Castagna, Maria Eloisa, Coffa, Salvatore, Monaco, Mariantonietta, Muscara, Anna, Caristia, Liliana, Lorenti, Simona, Messina, Alberto

    “…We report on the fabrication and performances of highly efficient Si-based light sources. The devices consist of MOS structures with erbium (Er) implanted in…”
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    Journal Article
  4. 4

    Si-based materials and devices for light emission in silicon by Castagna, Maria Eloisa, Coffa, Salvatore, Monaco, Mariantonietta, Caristia, Liliana, Messina, Alberto, Mangano, Rosario, Bongiorno, Corrado

    “…We report on the fabrication and performances of extremely efficient Si-based light sources. The devices consist of MOS structures with erbium (Er) implanted…”
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    Journal Article
  5. 5

    Quantitative electron energy loss spectroscopy of Si nanoclusters embedded in SiO x by Nicotra, G., Bongiorno, C., Caristia, L., Coffa, S., Spinella, C.

    Published in Microelectronic engineering (2007)
    “…We have used a methodology, based on electron energy loss spectroscopy combined with energy filtered images, which allows us to quantify the clustered silicon…”
    Get full text
    Journal Article
  6. 6

    Role of the internal strain on the incomplete Si ∕ Si O 2 phase separationin substoichiometric silicon oxide films by La Magna, A., Nicotra, G., Bongiorno, C., Spinella, C., Grimaldi, M. G., Rimini, E., Caristia, L., Coffa, S.

    Published in Applied physics letters (30-04-2007)
    “…Silicon nanoclusters were formed in plasma-enhanced chemical vapor deposited substoichiometric silicon oxide films by annealing at 1100 ° C for 1 ∕ 2 h as a…”
    Get full text
    Journal Article
  7. 7
  8. 8

    Laser annealing of a-Si for realization of polycrystalline Si film on plastic substrate by Mangano, F., Caristia, L., Costa, N., Camalleri, M., Ravesi, S., Scalese, S., Bagiante, S., Privitera, V.

    “…In this paper we discuss the laser annealing crystallization of hydrogenated a-Si film deposited at 250degC by means of PECVD technique. Abrupt out-diffusion…”
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    Conference Proceeding
  9. 9