Search Results - "Carballo, V.M. Blanco"

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  1. 1

    Moisture resistance of SU-8 and KMPR as structural material by Blanco Carballo, V.M., Melai, J., Salm, C., Schmitz, J.

    Published in Microelectronic engineering (01-04-2009)
    “…This paper treats the moisture resistance of SU-8 and KMPR, two photoresists considered as structural material in microsystems. Our experiments focus on the…”
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    Journal Article Conference Proceeding
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    TwinGrid: A wafer post-processed multistage Micro Patterned Gaseous Detector by Bilevych, Y., Carballo, V.M. Blanco, Chefdeville, M., Fransen, M., van der Graaf, H., Salm, C., Schmitz, J., Timmermans, J.

    “…This paper presents a new multistage Micro Patterned Gaseous Detector (MPGD) made by wafer post-processing. The device consists of a double metal grid…”
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    Journal Article
  4. 4

    GEMGrid: a wafer post-processed GEM-like radiation detector by Blanco Carballo, V.M., Bilevych, Y., Chefdeville, M., Fransen, M., van der Graaf, H., Salm, C., Schmitz, J., Timmermans, J.

    “…This paper presents a new wafer post-processed micropatterned gaseous radiation detector called GEMGrid. The device consists of a GEM-like structure fabricated…”
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    Journal Article
  5. 5

    A CMOS compatible Microbulk Micromegas-like detector using silicon oxide as spacer material by Blanco Carballo, V.M., Fransen, M., van der Graaf, H., Lu, J., Schmitz, J.

    “…We present a new Micro Pattern Gaseous Detector (MPGD) fabricated with nonpolymeric materials. The device structure is similar to a Microbulk Micromegas…”
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    Journal Article
  6. 6

    Bonding induced distortion in wafer-to-wafer bonding applications: how the scanner and Yieldstar can enable 3D integration by Carballo, V.M. Blanco, Renaud, V., Iacovo, S., Jourdain, A., Hsu, A., Tseng, Y., Tabery, C., De Poortere, E. P.

    “…In this work, we have developed a two-layer short loop process on device wafers to study the distortion fingerprint induced by a wafer-to-wafer bonding…”
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    Conference Proceeding
  7. 7

    Suspended membranes, cantilevers and beams using SU-8 foils by Melai, J., Blanco Carballo, V.M., Salm, C., Schmitz, J.

    Published in Microelectronic engineering (01-05-2010)
    “…This paper presents a fast, easy and low-cost method to create suspended structures using SU-8 photoresist. The method consists of laminating SU-8 foils on top…”
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    Journal Article Conference Proceeding
  8. 8

    Patterning process and electrical yield optimization at the limits of single exposure EUV 0.33 NA: a pitch 26nm damascene process by Carballo, V.M. Blanco, De Wachter, K. Vandersmissen. B., Nafus, K., Feurprier, Y., Thiam, A., Hsu, A., Tabery, C., Doise, J., De Schepper, P.

    “…In this work we have developed a single layer short loop damascene process to evaluate and optimize patterning performance of pitch 26nm single exposure 0.33…”
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    Conference Proceeding
  9. 9

    Pulse height fluctuations of integrated micromegas detectors by Chefdeville, M., van der Graaf, H., Hartjes, F., Timmermans, J., Visschers, J., Blanco Carballo, V.M., Salm, C., Schmitz, J., Smits, S., Colas, P., Giomataris, I.

    “…Recent publications report that Micromegas-based detectors exhibit very good energy resolution for gaseous radiation detectors. When made in microtechnology,…”
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    Journal Article
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    On the geometrical design of integrated Micromegas detectors by Blanco Carballo, V.M., Salm, C., Smits, S.M., Schmitz, J., Chefdeville, M., van der Graaf, H., Timmermans, J., Visschers, J.L.

    “…This paper presents the operational characteristics of several integrated Micromegas detectors. These detectors called InGrids are made by means of…”
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    Journal Article
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    Dual Damascene 28nm-Pitch Single Exposure EUV Design Rules Evaluation by Voltage Contrast Characterization by Carballo, V.M. Blanco, Cerbu, D., Schleicher, F., van de Kerkhove, J., Leray, P., Kissoon, N. N., De Poortere, E. P.

    “…In this work we have fabricated 28nm-pitch dual damascene structures using EUV single exposure for both via and metal. Ruthenium metallization has been used…”
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    Conference Proceeding
  13. 13

    New results from GridPix detectors by Bilevych, Y., Blanco Carballo, V.M., Chefdeville, M., Fransen, M., vd Graaf, H., de Groot, N., Hartjes, F., Konig, A., de Nooij, L., Rogers, M., Schmitz, J., Timmermans, J., Visschers, J., Romaniouk, A., Konovalov, S., Morozov, S.

    “…GridPix detector prototypes have been made using a TimePix pixel chip and a PSI 46 pixel chip. A system of discharge protection has been successfully tested…”
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    Conference Proceeding
  14. 14

    Results from MPGDs with a protected timepix or medipix-2 pixel sensor as active anode by Bosma, M., Schmitz, J., Timmermans, J., Visschers, J.L., Wyrsch, N., Blanco Carballo, V.M., Bylevich, Y., Chefdeville, M., Fransen, M., van der Graaf, H., Hartjesa, F., Melai, J., Salm, C.

    “…The functioning of a high-resistive, hydrogenated amorphous Silicon layer as a protection against discharges for Micoomegas-based pixel readout gaseous…”
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    Conference Proceeding
  15. 15

    A miniaturized multiwire proportional chamber using CMOS wafer scale post-processing by Blanco Carballo, V.M., Chefdeville, M., van der Graaf, H., Salm, C., Aarnink, A.A.I., Smits, S.M., Altpeter, D.M., Timmermans, J., Visschers, J.L., Schmitz, J.

    “…This paper presents the technology of a new microsystem consisting of a CMOS chip with integrated high voltage electrodes, to be used as a detector for…”
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    Conference Proceeding
  16. 16

    Discharge Protection and Ageing of Micromegas Pixel Detectors by Aarts, A.A., Blanco Carballo, V.M., Chefdeville, M., Colas, P., Dunand, S., Fransen, M., van der Graaf, H., Giomataris, Y., Hartjes, F., Koffeman, E., Melai, J., Peek, H., Riegler, W., Salm, C., Schmitz, J., Smits, S.M., Timmermans, J., Visschers, J.L., Wyrsch, N.

    “…GridPix is a gas-filled detector in which a Micromegas is combined with a CMOS pixel chip. The GridPix detector, originally developed for the readout of TPCs,…”
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    Conference Proceeding