Search Results - "Campabadal, Francesca"
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1
Variability in Resistive Memories
Published in Advanced intelligent systems (01-06-2023)“…Resistive memories are outstanding electron devices that have displayed a large potential in a plethora of applications such as nonvolatile data storage,…”
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2
True Random Number Generator based on the Variability of the High Resistance State of RRAMs
Published in IEEE access (01-01-2023)“…Hardware-based security primitives like True Random Number Generators (TRNG) have become a crucial part in protecting data over communication channels. With…”
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3
Study From Cryogenic to High Temperatures of the High- and Low-Resistance-State Currents of ReRAM Ni-HfO2-Si Capacitors
Published in IEEE transactions on electron devices (01-05-2016)“…Resistive switching conduction in Ni/HfO 2 /Si capacitors is studied at temperatures ranging from 77 to 473 K. A model for the low-resistance state (LRS)…”
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4
Thermal Characterization of Conductive Filaments in Unipolar Resistive Memories
Published in Micromachines (Basel) (10-03-2023)“…A methodology to estimate the device temperature in resistive random access memories (RRAMs) is presented. Unipolar devices, which are known to be highly…”
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Blistering of atomic layer deposition Al2O3 layers grown on silicon and its effect on metal–insulator–semiconductor structures
Published in Journal of vacuum science & technology. A, Vacuum, surfaces, and films (01-01-2013)“…In this work, a study of the influence of the processing conditions on the blistering of Al2O3 layers grown by atomic layer deposition (ALD) on silicon…”
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6
Threshold Switching and Conductance Quantization in Al/HfO2/Si(p) Structures
Published in Jpn J Appl Phys (25-04-2013)“…Volatile threshold switching and non-volatile memory switching modes of resistive switching are reported in Al/HfO 2 /Si(p) metal--oxide--semiconductor…”
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Standards for the Characterization of Endurance in Resistive Switching Devices
Published in ACS nano (23-11-2021)“…Resistive switching (RS) devices are emerging electronic components that could have applications in multiple types of integrated circuits, including electronic…”
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8
Cycle-to-cycle variability analysis of Ti/Al2O3-based memristors
Published in Solid-state electronics (01-12-2023)Get full text
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9
Impact of the temperature on the conductive filament morphology in HfO2-based RRAM
Published in Materials letters (15-02-2024)Get full text
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10
A novel biosensor based on hafnium oxide: Application for early stage detection of human interleukin-10
Published in Sensors and actuators. B, Chemical (01-12-2012)“…Measurement of interleukin-10 (IL-10) has subsequently become a crucial tool to identify end-stage heart failure (ESHF) patients prone to adverse outcomes…”
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11
Methodology for the characterization and observation of filamentary spots in HfOx-based memristor devices
Published in Microelectronic engineering (15-02-2020)“…Filamentary TiN/Ti/HfO2/W resistive switching devices were fabricated and electrically measured setting them in different resistance and degradation…”
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12
Reset transition in HfO2-Based memristors using a constant power signal
Published in Materials science in semiconductor processing (01-02-2025)“…Memristors, also known as resistive switching devices, have great potential for applications in memory and neuromorphic systems. Understanding the switching…”
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13
Experimental evaluation of the dynamic route map in the reset transition of memristive ReRAMs
Published in Chaos, solitons and fractals (01-10-2020)“…In this paper, we analyze the reset transition in bipolar TiN/Ti/HfO2 (10 nm)/Al2O3(2 nm)/W ReRAM devices using a tool that allows studying the temporal…”
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14
Resistive Switching with Self-Rectifying Tunability and Influence of the Oxide Layer Thickness in Ni/HfO2/n+-Si RRAM Devices
Published in IEEE transactions on electron devices (01-08-2017)“…The impact of the dielectric thickness, forming polarity, and current compliance on the self-rectifying current-voltage(I-V) characteristics of Ni/HfO 2 /n +…”
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15
Application of the Clustering Model to Time-Correlated Oxide Breakdown Events in Multilevel Antifuse Memory Cells
Published in IEEE electron device letters (01-12-2020)“…Time statistics for successive breakdown (BD) events in Al 2 O 3 /HfO 2 -based nanolaminates aimed to the development of multilevel one-time programmable (OTP)…”
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16
On the chaotic nature of random telegraph noise in unipolar RRAM memristor devices
Published in Chaos, solitons and fractals (01-07-2022)“…Random telegraph noise (RTN) owns its very name to its assumed stochastic nature. In this paper, we follow up previous works that questioned this stochastic…”
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17
Exploring Conductance Quantization Effects in Electroformed Filaments for Their Potential Application to a Resistance Standard
Published in Advanced quantum technologies (Online) (01-07-2023)“…The ballistic conduction through narrow constrictions connecting charge reservoirs exhibits conductance quantization effects. Since the quantum of conductance…”
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18
Unpredictable Bits Generation Based on RRAM Parallel Configuration
Published in IEEE electron device letters (01-02-2019)“…In this letter, a cell with the parallel combination of two TiN/Ti/HfO 2 /W resistive random access memory (RRAM) devices is studied for the generation of…”
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Study of the set and reset transitions in HfO2-based ReRAM devices using a capacitor discharge
Published in Solid-state electronics (01-09-2021)“…[Display omitted] In this work, we have studied the set and the reset transitions in hafnium oxide-based metal–insulator-metal ReRAM devices using a capacitor…”
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20
Investigation of Filamentary Current Fluctuations Features in the High-Resistance State of Ni/HfO2-Based RRAM
Published in IEEE transactions on electron devices (01-08-2016)“…In this paper, the presence of filamentary current instabilities in the high resistance state of Ni/HfO 2 -based RRAM devices and their associated current…”
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