Search Results - "Caine, E.J."

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  1. 1

    Improved charge control and frequency performance in InAs/AlSb-based heterostructure field-effect transistors by Bolognesi, C.R., Caine, E.J., Kroemer, H.

    Published in IEEE electron device letters (01-01-1994)
    “…We demonstrate high-speed InAs/AlSb-based heterostructure field-effect transistors (HFET's) displaying greatly improved charge control properties and enhanced…”
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    Journal Article
  2. 2

    Microwave performance of a digital alloy barrier Al(Sb,As)/AlSb/InAs heterostructure field-effect transistor by Bolognesi, C.R., Werking, J.D., Caine, E.J., Kroemer, H., Hu, E.L.

    Published in IEEE electron device letters (01-01-1993)
    “…High-speed, digital alloy barrier-based, Al(Sb,As)/AlSb/InAs heterostructure field-effect transistors (HFETs) fabricated using a standard mesa process are…”
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    Journal Article
  3. 3

    Improved charge control and the frequency performance in InAs/AlSb HFET's by Bolognesi, C.R., Caine, E.J., Kroemer, H.

    Published in IEEE transactions on electron devices (01-11-1993)
    “…Summary form only given. It is shown how the well thickness and the buffer layers influence the charge control properties of InAs/AlSb HFETs (heterostructure…”
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    Journal Article
  4. 4

    Fabrication and characterization of III–V compound semiconductor Bragg-Fresnel lenses for hard x-ray microfocusing by Caine, E.J., Shi, S., Hu, E.L., Li, Y., Idziak, S.H.J., Subramanian, G., Safinya, C.R.

    Published in Microelectronic engineering (01-02-1997)
    “…Hard x-ray phase Bragg-Fresnel lenses (BFLs) have been made in III–V semiconductors of (111) GaAs and InP, and in Si for comparison purposes. Diffractive…”
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    Journal Article
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    A GaP decomposition source for producing a dimer phosphorus molecular beam free of gallium and tetramer phosphorus by Mondry, M. J., Caine, E. J., Kroemer, H.

    “…The complications arising in the molecular beam epitaxial growth of phosphides are reduced through the use of a diatomic phosphorus beam. We have fabricated a…”
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  7. 7

    An (Al,Ga)As/GaAs heterostructure bipolar transistor with nonalloyed graded-gap ohmic contacts to the base and emitter by Rao, M.A., Caine, E.J., Long, S.I., Kroemer, H.

    Published in IEEE electron device letters (01-01-1987)
    “…Graded regions of n-(Ga,In)As and p-Ga(As,Sb) were incorporated side-by-side as emitter and base contacts, respectively, into an n-p-n (Al,Ga)As/GaAs…”
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