Search Results - "COTRINO, J"
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Surface chemistry and germination improvement of Quinoa seeds subjected to plasma activation
Published in Scientific reports (19-07-2017)“…Plasma treatment is recognized as a suitable technology to improve germination efficiency of numerous seeds. In this work Quinoa seeds have been subjected to…”
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2
Growth regimes of porous gold thin films deposited by magnetron sputtering at oblique incidence: from compact to columnar microstructures
Published in Nanotechnology (01-02-2013)“…Growth regimes of gold thin films deposited by magnetron sputtering at oblique angles and low temperatures are studied from both theoretical and experimental…”
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3
H2 Production from NH3 in a BaTiO3 Moderated Ferroelectric Packed-Bed Plasma Reactor
Published in Plasma chemistry and plasma processing (01-11-2023)“…Plasma decomposition reactions are used for various gas phase chemical processes including the decomposition of ammonia. In this work we show that pure ammonia…”
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4
On the kinetic and thermodynamic electron temperatures in non-thermal plasmas
Published in Europhysics letters (01-01-2014)“…The framework to describe the out-of-equilibrium free electrons in cold plasmas is developed assuming the electron entropy is defined through the Boltzmann…”
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5
XPS investigation of the reaction of carbon with NO, O2, N2 and H2O plasmas
Published in Carbon (New York) (2007)“…The interaction of graphite with plasmas of pure gases (O2, N2 or H2O), air or mixtures of gases containing NO has been studied by XPS 'in situ' analysis…”
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6
Low refractive index SiOF thin films prepared by reactive magnetron sputtering
Published in Thin solid films (02-09-2013)“…We have studied low refractive index fluorine doped silica thin films prepared by reactive magnetron sputtering. Two experimental parameters were varied to…”
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7
Chemical State of Nitrogen and Visible Surface and Schottky Barrier Driven Photoactivities of N-Doped TiO2 Thin Films
Published in Journal of physical chemistry. C (30-07-2009)“…N-doped TiO2 thin films have been prepared by plasma enhanced chemical vapor deposition and by physical vapor deposition by adding nitrogen or ammonia to the…”
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8
Band Gap Narrowing versus Formation of Electronic States in the Gap in N−TiO2 Thin Films
Published in Journal of physical chemistry. C (30-12-2010)“…N-containing TiO2 thin films with different amounts of nitrogen have been prepared by plasma enhanced chemical vapor deposition (PECVD) by using different…”
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9
Lateral and in-depth distribution of functional groups on diamond-like carbon after oxygen plasma treatments
Published in Diamond and related materials (01-02-2011)“…A diamond like carbon material has been exposed to a low pressure microwave and atmospheric pressure plasma of oxygen to enhance its hydrophilicity and surface…”
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10
Reforming of ethanol in a microwave surface-wave plasma discharge
Published in Applied physics letters (01-11-2004)“…Hydrogen production through plasma reforming of ethanol at room temperature and moderate pressure has been carried out in a microwave surface-wave reactor…”
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11
Influence of the angular distribution function of incident particles on the microstructure and anomalous scaling behavior of thin films
Published in Physical review letters (16-06-2006)“…The microstructure and the scaling properties of films grown by plasma enhanced chemical vapor deposition are reproduced with a discrete model that takes into…”
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12
Plasma catalysis with perovskite-type catalysts for the removal of NO and CH4 from combustion exhausts
Published in Journal of catalysis (25-04-2007)“…The removal of NO and CH4 from quaternary gas mixtures simulating the conditions existing in real combustion exhausts has been studied with a hybrid system…”
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13
Growth of SiO2 and TiO2 thin films deposited by reactive magnetron sputtering and PECVD by the incorporation of non-directional deposition fluxes
Published in Physica status solidi. A, Applications and materials science (01-04-2013)“…We have deposited TiO2 and SiO2 thin films by techniques as different as plasma‐enhanced chemical vapor deposition (PECVD) and reactive magnetron sputtering…”
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14
Quantification of the H content in diamondlike carbon and polymeric thin films by reflection electron energy loss spectroscopy
Published in Applied physics letters (22-08-2005)“…A nondestructive method to determine the hydrogen content at the surface of diamondlike carbon and polymeric thin films is proposed. The method relies on the…”
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15
Plasma Chemistry of NO in Complex Gas Mixtures Excited with a Surfatron Launcher
Published in The journal of physical chemistry. A, Molecules, spectroscopy, kinetics, environment, & general theory (09-06-2005)“…The plasma chemistry of NO has been investigated in gas mixtures with oxygen and/or hydrocarbon and Ar as carrier gas. Surface wave discharges operating at…”
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16
Determination of the hydrogen content in diamond-like carbon and polymeric thin films by reflection electron energy loss spectroscopy
Published in Diamond and related materials (01-01-2007)“…A new non-destructive method to determine hydrogen content in diamond-like carbon and polymeric thin film materials is developed. The method relies on…”
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17
Low temperature synthesis of dense SiO2 thin films by ion beam induced chemical vapor deposition
Published in Thin solid films (21-09-2001)Get full text
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18
Synthesis of SiO2 and SiOxCyHz thin films by microwave plasma CVD
Published in Thin solid films (17-12-2001)Get full text
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19
First nucleation steps during deposition of SiO2 thin films by plasma enhanced chemical vapour deposition
Published in Surface science (15-05-2007)“…The initial nucleation stages during deposition of SiO2 by remote plasma enhanced chemical vapour deposition (PECVD) have been monitored by XPS inelastic peak…”
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A structural study of organo-silicon polymeric thin films deposited by remote microwave plasma enhanced chemical vapour deposition
Published in Surface & coatings technology (01-03-2004)“…SiO x C y H z thin films with different Si/C and Si/O ratios have been prepared by plasma enhanced chemical vapour deposition, using (CH 3) 3SiCl as precursor…”
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