Search Results - "CHI-MIN YUAN"

Implementing attenuated phase shift masks for contacts in production by CHI-MIN YUAN, POL, V, GAROFALO, J, PIERRAT, C

“…It has been shown that the attenuated phase shift mask (PSM) is best suited for imaging dark-field patterns ( e.g. , contacts, vias, and metal lines) when…”
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Modeling optical equipment for wafer alignment and line-width measurement by Yuan, C.-M., Strojwas, A.J.

“…A methodology is presented for modeling a wide variety of optical metrology equipment currently utilized in integrated circuit manufacturing. These tools…”
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Calculation of one-dimensional lithographic aerial images using the vector theory by Yuan, C.-M.

“…The vector theory is developed and employed to calculate 1-D aerial images by numerically solving Maxwell's equations to account for the scattering effect from…”
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Efficient light scattering modeling for alignment, metrology, and resist exposure in photolithography by Yuan, C.-M.

“…In previous work, a two-dimensional waveguide model has been developed and examined extensively so that rigorous light scattering calculations for…”
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A Fast 2D Numerical Algorithm for Photolithography Applications by Chi-Min Yuan

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Modeling of optical alignment and metrology in VLSI manufacturing by Yuan, Chi-Min

“…The object of this thesis is to develop rigorous models to simulate optical images of semiconductor structures detected by various optical alignment and…”
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Modeling of optical alignment and metrology in VLSI manufacturing by Yuan, Chi-Min

“…The object of this thesis is to develop rigorous models to simulate optical images of semiconductor structures detected by various optical alignment and…”
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Numerical Modeling Of Optical Metrology Schemes For IC Line-width Measurements by Chi-Min Yuan, Strojwas, A.J.

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Logic design for printability using OPC methods by Lucas, K., Yuan, C.-M., Boone, R., Wimmer, K., Strozewski, K., Toublan, O.

“…The steps that create physical shape data in a typical logic device design-to-reticle flow are cell layout, place and route, tapeout, OPC or RET, data…”
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Imaging techniques to support low k1 optical lithography by Conley, W., Nelson-Thomas, C., Brankner, K., Wei Wu, Strozewski, K., Thompson, M., Lucas, K., Garza, C., Chi-Min Yuan, Carter, R., Montgomery, P., Socha, R., Yu, L., van den Broke, D., Wampler, K., Schaefer, E., Cassel, S., Kuijten, J.-P., Verhappen, A., Pijnenburg, W., Maltabes, J.G., Dieu, L., Fanucchi, E.L., Hughes, G., Mellenthin, D., Kasprowicz, B., Progler, C.

“…Summary form only given. With half pitch k factors rapidly approaching sub 0.4, many lithography groups have looked seriously into alternative patterning and…”
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Physically-based models of alignment schemes in commercial steppers by Yuan, C.-M., Strojwas, A.J.

“…Optical alignment between reticle and wafer in photolithography processes has become one of the limiting factors for achieving submicron design rules. Various…”
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