Search Results - "Byungwhan Kim"

Deposition rate of SiN film grown by using a pulsed-PECVD at room-temperature by Kim, Suyeon, Kim, Byungwhan

“…Using a pulsed-plasma enhanced chemical vapor deposition, silicon nitride (SiN) films were deposited in SiH 4–NH 3 plasma at room-temperature. The bias power…”
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Modeling of plasma process data using a multi-parameterized generalized regression neural network by Kim, Byungwhan, Kwon, Minji, Kwon, Sang Hee

“…For characterization or optimization process, a computer prediction model is in demand. A new technique, to improve the prediction performance of conventional…”
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Room-temperature high radio-frequency source power effects on silicon nitride films deposited by using a plasma-enhanced chemical vapor deposition by Kim, Byungwhan, Kim, Suyeon

“…Silicon nitride films were deposited at room temperature using a plasma-enhanced chemical vapor deposition system. In this study, the effects of radio…”
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Radio frequency source power-induced ion energy impact on SiN films deposited by using a pulsed-PECVD in SiH4–N2 plasma at room temperature by Lee, Hwajune, Kim, Byungwhan, Kwon, Sanghee

“…Using a radio frequency (rf) pulsed-plasma enhanced chemical vapor deposition system, silicon nitride (SiN) films were deposited in a SiH4–N2 inductively…”
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Modeling of a hemispherical inductively coupled plasma using neural network by Kim, Byungwhan, Kim, Suyeon

“…In this study, a hemispherical inductively coupled plasma (HICP) was modeled by using a neural network called a radial basis function network (RBFN). The…”
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Radio frequency bias power effects on silicon nitride film deposited in SiH4-NH3 using a plasma-enhanced chemical vapor deposition by Kim, Suyean, Kim, Byungwhan

“…Silicon nitride films were deposited at room temperature in a plasma-enhanced chemical vapor deposition system. Ion energy and ion energy flux were measured…”
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Prediction on the seasonal behavior of hydrogen sulfide using a neural network model by Kim, Byungwhan, Lee, Joogong, Jang, Jungyoung, Han, Dongil, Kim, Ki-Hyun

“…Models to predict seasonal hydrogen sulfide (H2S) concentrations were constructed using neural networks. To this end, two types of generalized regression…”
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Impact of bias power-induced ion energy on refractive index of SiN films room-temperature deposited in SiH4–NH3–N2 pulsed plasma by Kwon, Sanghee, Lee, Hwajun, Kim, Byungwhan

“…Using a pulsed-plasma-enhanced chemical vapor deposition system, silicon nitride films were deposited at room temperature in SiH4–NH3–N2 plasma. The impact of…”
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Functional Kernel-Based Modeling of Wavelet Compressed Optical Emission Spectral Data: Prediction of Plasma Etch Process by Ko, Young-Don, Jeong, Young-Seon, Jeong, Myong-Kee, Garcia-Diaz, Alberto, Kim, Byungwhan

“…This study reports the use of a kernel-based process model, consisting of kernel partial least squares regression and kernel ridge regression, to model etch…”
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Prediction of profile surface roughness in CHF3/CF4 plasma using neural network by Kim, Byungwhan, Kim, Kunho

“…Using a neural network, a profile roughness of plasma etching is characterized. The etching was conducted in a CHF3/CF4 inductively coupled plasma. The etch…”
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Prediction of SiC etching in a NF3∕CH4 plasma using neural network by Kim, Byungwhan, Lee, Byung Teak

“…Silicon carbide (SiC) was etched in a NF3∕CH4 inductively coupled plasma. The etch process was modeled by using a neural network called generalized regression…”
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Measurement of surface roughness of plasma-deposited films using laser speckles by Kim, Byungwhan, Seo, Junhyun

“…•This work presents a new method for characterizing surface roughness of deposited films.•It quantifies pixel information representing speckle pattern in terms…”
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Visualization of atom's orbits by Kim, Byungwhan

“…High-resolution imaging techniques have been used to obtain views of internal shapes of single atoms or columns of atoms. This review article focuses on the…”
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Characterization of inductively coupled plasma using neural networks by Kim, Byungwhan, Park, Sungjin

“…Hemispherical inductively coupled plasma (HICP) in a chlorine (Cl/sub 2/) discharge is qualitatively characterized using neural networks. Plasma attributes…”
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Prediction of plasma etching using a polynomial neural network by Kim, Byungwhan, Kim, Dong Won, Park, Gwi Tae

“…A polynomial neural network (PNN) is first applied to construct a predictive model of plasma etch processes. The process was characterized by a full-factorial…”
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Relationships between etch rate and roughness of plasma etched surface by KIM, Byungwhan, LEE, Byung-Teak

“…Relationships between etch rate and surface roughness are examined as a function of process factors, including source power, bias power, pressure, and O/sub 2/…”
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Qualitative fuzzy logic model of plasma etching process by Kim, Byungwhan, Park, Jang Hyun

“…Plasma etching is key to transferring fine patterns. Accurate prediction models are highly demanded to gain improved insights into plasma discharges, as well…”
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Modeling plasma equipment using neural networks by Kim, Byungwhan, Park, Gwi Tae

“…Equipment plasma has been modeled semi-empirically using neural networks in conjunction with statistical experimental design. A 3/sup 3/ factorial design was…”
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Modeling etch rate and uniformity of oxide via etching in a CHF3/CF4 plasma using neural networks by KIM, Byungwhan, KWON, Kwang-Ho, KWON, Sung-Ku, PARK, Jong-Moon, SEONG WOOK YOO, PARK, Kun-Sik, YOU, In-Kyu, KIM, Bo-Woo

“…An oxide film etched in a magnetically-enhanced CHF3/CF4 plasma has been modeled using neural networks. The etch process was characterized with a 24-1…”
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Proximity-controlled silicon carbide etching in inductively coupled plasma by Kim, Byungwhan, Kim, Sungmo, Ann, Soo-Chnag, Lee, Byung-Teak

“…By controlling the proximity relative to plasma source, silicon carbide (SiC) has been etched in a C 2F 6 inductively coupled plasma. This was accomplished by…”
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