Search Results - "Botzakaki, Martha A."

Study of Si Nanowires Produced by Metal-Assisted Chemical Etching as a Light-Trapping Material in n‑type c‑Si Solar Cells by Leontis, Ioannis, Botzakaki, Martha A, Georga, Stavroula N, Nassiopoulou, A. Galiouna

“…Si nanowires (SiNWs) produced by metal-assisted chemical etching on n-type Si were investigated for their use as a light-trapping material in c-Si solar cells…”
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XPS analysis and electrical conduction mechanisms of atomic layer deposition grown Ta2O5 thin films onto p-Si substrates by Korkos, Spyridon, Xanthopoulos, Nikolaos J., Botzakaki, Martha A., Drivas, Charalampos, Kennou, Styliani, Ladas, Spyridon, Travlos, Anastasios, Georga, Stavroula N., Krontiras, Christoforos A.

“…Metal oxide semiconductor capacitors that incorporate tantalum pentoxide (Ta2O5) thin films as dielectric were fabricated via the atomic layer deposition (ALD)…”
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Improved Stability of Polymer Solar Cells in Ambient Air via Atomic Layer Deposition of Ultrathin Dielectric Layers by Polydorou, Ermioni, Botzakaki, Martha A., Sakellis, Ilias, Soultati, Anastasia, Kaltzoglou, Andreas, Papadopoulos, Theodoros A., Briscoe, Joe, Drivas, Charalabos, Seintis, Kostas, Fakis, Mihalis, Palilis, Leonidas C., Georga, Stavroula N., Krontiras, Christoforos A., Kennou, Stella, Falaras, Polycarpos, Boukos, Nikos, Davazoglou, Dimitris, Argitis, Panagiotis, Vasilopoulou, Maria

“…Polymer solar cells have attracted tremendous interest in the highly competitive solar energy sector, due to the practical advantages they exhibit, such as…”
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Influence of the atomic layer deposition temperature on the structural and electrical properties of Al/Al2O3/p-Ge MOS structures by Botzakaki, Martha A., Skoulatakis, George, Xanthopoulos, Nikolaos, Gianneta, Violetta, Travlos, Anastasios, Kennou, Stella, Ladas, Spyridon, Tsamis, Christos, Makarona, Eleni, Georga, Stavroula N., Krontiras, Christoforos A.

“…The influence of deposition temperature on the structural, chemical, and electrical properties of atomic layer deposition (ALD)-Al2O3 thin films is…”
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Probing the properties of atomic layer deposited ZrO2 films on p-Germanium substrates by Kerasidou, Ariadne P., Botzakaki, Martha A., Xanthopoulos, Nikolaos, Kennou, Stella, Ladas, Spyridon, Georga, Stavroula N., Krontiras, Christoforos A.

“…Zirconium oxide (ZrO2) thin films of 5 and 25 nm thickness were deposited by atomic layer deposition at 250 °C on p-type Ge substrates. The stoichiometry,…”
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