Search Results - "Bodas, Dhananjay S."

Deposition of PTFE thin films by RF plasma sputtering on 〈100〉 silicon substrates by Bodas, Dhananjay S, Mandale, A B, Gangal, S A

“…Polymers have been studied extensively due to the wonderful array of properties presented by them. Polymer materials can be coated/deposited by various…”
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Fabrication of long-term hydrophilic surfaces of poly(dimethyl siloxane) using 2-hydroxy ethyl methacrylate by Bodas, Dhananjay S., Khan-Malek, Chantal

“…In the present work, 2-hydroxy ethyl methacrylate (HEMA) was used to modify surface of poly(dimethyl siloxane) (PDMS) elastomer. Fourier transform infrared…”
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In vitro and in vivo studies of a novel bacterial cellulose-based acellular bilayer nanocomposite scaffold for the repair of osteochondral defects by Kumbhar, Jyoti V, Jadhav, Sachin H, Bodas, Dhananjay S, Barhanpurkar-Naik, Amruta, Wani, Mohan R, Paknikar, Kishore M, Rajwade, Jyutika M

“…Bacterial cellulose (BC) is a naturally occurring nanofibrous biomaterial which exhibits unique physical properties and is amenable to chemical modifications…”
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Deposition of indium nitride films by activated reactive evaporation process – a feasibility study by Patil, Sheetal J., Bodas, Dhananjay S., Mandale, A.B., Gangal, S.A.

“…Indium nitride (InN) films are deposited by ‘activated reactive evaporation (ARE)’ process using parallel plate coupled nitrogen plasma (radio frequency source…”
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Characterization of indium nitride films deposited by activated reactive evaporation process by Patil, Sheetal J., Bodas, Dhananjay S., Mandale, A.B., Gangal, S.A.

“…Indium nitride films are deposited in the presence of nitrogen plasma by ‘activated reactive evaporation (ARE)’ process on silicon substrate maintained at room…”
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Deposition of plasma-polymerized hydroxyethyl methacrylate (HEMA) on silicon in presence of argon plasma by Bodas, Dhananjay S., Desai, Shrojal M., Gangal, S.A.

“…2-hydroxyethyl methacrylate (HEMA) has been deposited onto the surface of silicon substrate (thickness = 500 μm) using plasma polymerization technique…”
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Plasma-treated polymer as humidity sensing material—a feasibility study by Dabhade, R.V, Bodas, Dhananjay S, Gangal, S.A

“…Plasma treatment of polymers (surface modification) has been carried out for a long time namely for adhesion improvement and biomedical applications, as it is…”
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Poly(methyl methacrylate) as masking material for microelectromechanical system (MEMS) fabrication by Bodas, Dhananjay S., Gangal, S. A.

“…In the present study direct current (dc) sputtered poly(methyl methacrylate) (PMMA) films deposited on silicon substrates were evaluated as masking materials…”
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Structural characterization of sputtered PMMA in argon plasma by Bodas, Dhananjay S., Gangal, S.A.

“…PMMA has been extensively studied for the numerous applications in the field of coatings, adhesives, sensors, biomaterials etc. PMMA can be deposited by many…”
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Comparative study of spin coated and sputtered PMMA as an etch mask material for silicon micromachining by Bodas, Dhananjay S., Mahapatra, S.K., Gangal, S.A.

“…SiO 2 and Si 3N 4, are usually used to mask the selected portions during etching of silicon in anisotropic etchants like KOH but polymers are expected to be…”
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Fabrication of long-term hydrophilic elastomeric surfaces via plasma induced surface cross-linking of functional monomers by Desai, Shrojal M., Bodas, Dhananjay S., Singh, R.P.

“…A 3:1 composition of functional monomer:multifunctional acrylate was spin coated and later cross-linked under the influence of reactive gas plasma onto the…”
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RF sputter deposition of poly(tetrafluoroethylene) films as masking materials for silicon micromachining by Bodas, Dhananjay S., Patil, Sheetal J., Mandale, A. B., Gangal, S. A.

“…Polymers have been studied extensively because of their wonderful array of properties. Their properties can be tailored by many means and can be made useful in…”
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Characterization of silicon films deposited in presence of nitrogen plasma by Patil, Sheetal J., Bodas, Dhananjay S., Ethiraj, A.S., Purandare, R.C., Phatak, G.J., Kulkarni, S.K., Gangal, S.A.

“…Silicon films are deposited in presence of nitrogen plasma with the technique known as ‘activated reactive evaporation (ARE)’ with a view to deposit silicon…”
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Deposition of silicon films in presence of nitrogen plasma—A feasibility study by Patil, Sheetal J., Bodas, Dhananjay S., Phatak, G. J., Gangal, S. A.

“…A design, development and validation work of plasma based ‘activated reactive evaporation (ARE) system’ is implemented for the deposition of the silicon films…”
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Deposition of PTFE thin films by RF plasma sputtering on 〈1 0 0〉 silicon substrates by Bodas, Dhananjay S., Mandale, A.B., Gangal, S.A.

“…Polymers have been studied extensively due to the wonderful array of properties presented by them. Polymer materials can be coated/deposited by various…”
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Deposition of PTFE thin films by RF plasma sputtering on (100) silicon substrates by BODAS, Dhananjay S, MANDALE, A. B, GANGAL, S. A

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Comparative study of spin coated and sputtered PMMA as an etch mask for silicon micromachining by Bodas, D.S., Dabhade, R.V., Patil, S.J., Gangal, S.A.

“…Polymers can be very good alternatives to SiO/sub 2/ and Si/sub 3/N/sub 4/, which are normally used to mask the anisotropic etching of silicon in anisotropic…”
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