Search Results - "Bock, Claudia"

Femtosecond laser patterning of graphene electrodes for thin-film transistors by Kasischke, Maren, Subaşı, Ersoy, Bock, Claudia, Pham, Duy-Vu, Gurevich, Evgeny L., Kunze, Ulrich, Ostendorf, Andreas

“…The aim of this study is to assess femtosecond laser patterning of graphene in air and in vacuum for the application as source and drain electrodes in…”
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Interplay of Precursor and Plasma for The Deposition of HfO2 via PEALD: Film Growth and Dielectric Properties by Preischel, Florian, Zanders, David, Berning, Thomas, Kostka, Aleksander, Rogalla, Detlef, Bock, Claudia, Devi, Anjana

“…HfO2 thin films are appealing for microelectronic applications such as high‐κ dielectric layers, memristors, and ferroelectric memory devices. To fulfill the…”
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Influence of grain orientation on the local deformation mode induced by cavitation erosion in a CuSnNi alloy by Stella, Jorge, Pohl, Michael, Bock, Claudia, Kunze, Ulrich

“…The local deformation induced by vibratory cavitation erosion in a CuSnNi alloy was studied employing electron back-scattering diffraction and…”
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Formation of low- and high-spatial frequency laser-induced periodic surface structures (LIPSSs) in ALD-deposited MoS2 by Becher, Malte J. M. J., Jagosz, Julia, Bock, Claudia, Ostendorf, Andreas, Gurevich, Evgeny L.

“…The formation of laser-induced periodic surface structures (LIPSSs) on the atomic layer-deposited (ALD) molybdenum disulfide (MoS 2 ) upon femtosecond laser…”
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Nucleation and growth studies of large-area deposited WS2 on flexible substrates by Berning, Thomas, Becher, Malte, Wree, Jan-Lucas, Jagosz, Julia, Kostka, Aleksander, Ostendorf, Andreas, Devi, Anjana, Bock, Claudia

“…Transition metal dichalcogenides (TMDCs) such as tungsten disulfide (WS2) are studied for advanced electronic and optical devices because of their unique and…”
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Matrix-comprehensive in-house validation and robustness check of a confirmatory method for the determination of four nitrofuran metabolites in poultry muscle and shrimp by LC–MS/MS by Bock, Claudia, Gowik, Petra, Stachel, Carolin

“…An already well-described method for the determination of nitrofuran metabolites 3-amino-5-methyl-morpholino-2-oxazolidinone (AMOZ), 3-amino-2-oxazolidinone…”
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Reducing the frequency of respiratory tract infections in severe neurological disorders by inhaled antibiotics: a retrospective data analysis by Eckerland, Maximilian, Bock, Claudia, Olivier, Margarete, Pichlmaier, Leopold, Steindor, Mathis, Stehling, Florian

“…In patients with severe neurological impairment, recurrent respiratory tract infections frequently occur as a result of impaired clearance of airway secretions…”
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Indications and outcome of home high‐flow nasal therapy in children, a single‐center experience by Steindor, Mathis, Wagner, Carolin Ellen, Kavvalou, Alexandra, Bock, Claudia, Olivier, Margarete, Stehling, Florian

“…High‐flow nasal therapy (HFNT) is a safe and simple way to deliver humidified air and oxygen for respiratory support in infants and children. HFNT is well…”
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From Precursor Chemistry to Gas Sensors: Plasma‐Enhanced Atomic Layer Deposition Process Engineering for Zinc Oxide Layers from a Nonpyrophoric Zinc Precursor for Gas Barrier and Sensor Applications by Mai, Lukas, Mitschker, Felix, Bock, Claudia, Niesen, Alessia, Ciftyurek, Engin, Rogalla, Detlef, Mickler, Johannes, Erig, Matthias, Li, Zheshen, Awakowicz, Peter, Schierbaum, Klaus, Devi, Anjana

“…The identification of bis‐3‐(N,N‐dimethylamino)propyl zinc ([Zn(DMP)2], BDMPZ) as a safe and potential alternative to the highly pyrophoric diethyl zinc (DEZ)…”
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Cobalt Metal ALD: Understanding the Mechanism and Role of Zinc Alkyl Precursors as Reductants for Low-Resistivity Co Thin Films by Zanders, David, Liu, Ji, Obenlüneschloß, Jorit, Bock, Claudia, Rogalla, Detlef, Mai, Lukas, Nolan, Michael, Barry, Seán T, Devi, Anjana

“…In this work, we report a new and promising approach toward the atomic layer deposition (ALD) of metallic Co thin films. Utilizing the simple and known…”
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PEALD of HfO2 Thin Films: Precursor Tuning and a New Near-Ambient-Pressure XPS Approach to in Situ Examination of Thin-Film Surfaces Exposed to Reactive Gases by Zanders, David, Ciftyurek, Engin, Subaşı, Ersoy, Huster, Niklas, Bock, Claudia, Kostka, Aleksander, Rogalla, Detlef, Schierbaum, Klaus, Devi, Anjana

“…A bottom-up approach starting with the development of new Hf precursors for plasma-enhanced atomic layer deposition (PEALD) processes for HfO2 followed by in…”
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Ultrashort‐Pulsed‐Laser Annealing of Amorphous Atomic‐Layer‐Deposited MoS 2 Films by Becher, Malte Jonas Marius Julian, Jagosz, Julia, Neubieser, Rahel-Manuela, Wree, Jan-Lucas, Devi, Anjana, Michel, Marvin, Bock, Claudia, Gurevich, Evgeny L., Ostendorf, Andreas

“…To implement 2D molybdenum disulfide (MoS 2 ) in the flexible electronic industry, large, uniform, and crystalline films on flexible substrates are needed…”
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Low-Temperature Plasma-Enhanced Atomic Layer Deposition of Tin(IV) Oxide from a Functionalized Alkyl Precursor: Fabrication and Evaluation of SnO2‑Based Thin-Film Transistor Devices by Mai, Lukas, Zanders, David, Subaşı, Ersoy, Ciftyurek, Engin, Hoppe, Christian, Rogalla, Detlef, Gilbert, Wolfram, Arcos, Teresa de los, Schierbaum, Klaus, Grundmeier, Guido, Bock, Claudia, Devi, Anjana

“…A bottom-up process from precursor development for tin to plasma-enhanced atomic layer deposition (PEALD) for tin­(IV) oxide and its successful implementation…”
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Interplay of Precursor and Plasma for The Deposition of HfO 2 via PEALD: Film Growth and Dielectric Properties by Preischel, Florian, Zanders, David, Berning, Thomas, Kostka, Aleksander, Rogalla, Detlef, Bock, Claudia, Devi, Anjana

“…Abstract HfO 2 thin films are appealing for microelectronic applications such as high‐ κ dielectric layers, memristors, and ferroelectric memory devices. To…”
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High-Quality Solution-Processed Silicon Oxide Gate Dielectric Applied on Indium Oxide Based Thin-Film Transistors by Jaehnike, Felix, Pham, Duy Vu, Anselmann, Ralf, Bock, Claudia, Kunze, Ulrich

“…A silicon oxide gate dielectric was synthesized by a facile sol–gel reaction and applied to solution-processed indium oxide based thin-film transistors (TFTs)…”
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Pulse Duration Dependent Formation of Laser‐Induced Periodic Surface Structures in Atomic Layer Deposited MoS 2 by Becher, Malte J. M. J., Ullrich, Jonas B., Jagosz, Julia, Kostka, Aleksander, Bock, Claudia, Ostendorf, Andreas, Gurevich, Evgeny L.

“…Abstract In this paper, the formation of laser‐induced periodic surface structures (LIPSS) on atomic‐layer deposited MoS 2 layers are studied experimentally…”
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Water assisted atomic layer deposition of yttrium oxide using tris( N , N '-diisopropyl-2-dimethylamido-guanidinato) yttrium(iii): process development, film characterization and functional properties by Mai, Lukas, Boysen, Nils, Subaşı, Ersoy, Arcos, Teresa de Los, Rogalla, Detlef, Grundmeier, Guido, Bock, Claudia, Lu, Hong-Liang, Devi, Anjana

“…We report a new atomic layer deposition (ALD) process for yttrium oxide (Y O ) thin films using tris( , -diisopropyl-2-dimethylamido-guanidinato) yttrium(iii)…”
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Low-Temperature Plasma-Enhanced Atomic Layer Deposition of Tin(IV) Oxide from a Functionalized Alkyl Precursor: Fabrication and Evaluation of SnO 2 -Based Thin-Film Transistor Devices by Mai, Lukas, Zanders, David, Subaşı, Ersoy, Ciftyurek, Engin, Hoppe, Christian, Rogalla, Detlef, Gilbert, Wolfram, Arcos, Teresa de Los, Schierbaum, Klaus, Grundmeier, Guido, Bock, Claudia, Devi, Anjana

“…A bottom-up process from precursor development for tin to plasma-enhanced atomic layer deposition (PEALD) for tin(IV) oxide and its successful implementation…”
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Atomic layer deposition of dielectric Y 2 O 3 thin films from a homoleptic yttrium formamidinate precursor and water by Boysen, Nils, Zanders, David, Berning, Thomas, Beer, Sebastian M J, Rogalla, Detlef, Bock, Claudia, Devi, Anjana

“…We report the application of tris( , '-diisopropyl-formamidinato)yttrium(iii) [Y(DPfAMD) ] as a promising precursor in a water-assisted thermal atomic layer…”
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Zinc Oxide: From Precursor Chemistry to Gas Sensors: Plasma‐Enhanced Atomic Layer Deposition Process Engineering for Zinc Oxide Layers from a Nonpyrophoric Zinc Precursor for Gas Barrier and Sensor Applications (Small 22/2020) by Mai, Lukas, Mitschker, Felix, Bock, Claudia, Niesen, Alessia, Ciftyurek, Engin, Rogalla, Detlef, Mickler, Johannes, Erig, Matthias, Li, Zheshen, Awakowicz, Peter, Schierbaum, Klaus, Devi, Anjana

“…In article number 1907506, Anjana Devi and co‐workers introduce a new, nonpyrophoric zinc precursor for plasma enhanced atomic layer deposition (PEALD) of zinc…”
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