Search Results - "Blech, I"

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    Diffusional back flows during electromigration by Blech, I.A.

    Published in Acta materialia (01-07-1998)
    “…Non-linear drift velocities have been reported when passing electrical currents through short metal lines. The aluminum drift velocity assumes very small…”
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    Journal Article Conference Proceeding
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    Metallic Phase with Long-Range Orientational Order and No Translational Symmetry by Shechtman, D, Blech, I, Gratias, D, Cahn, J W

    Published in Physical review letters (12-11-1984)
    “…A metallic solid (Al--14 at.% Mn) with long-range orientational order, but with icosahedral point group symmetry, which is inconsistent with lattice…”
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    Journal Article
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    Stress generation by electromigration by Blech, I. A., Herring, Conyers

    Published in Applied physics letters (01-08-1976)
    “…Stresses in aluminum thin films on TiN were studied in situ by transmission x-ray topography. Stress gradients were seen to build up in thin aluminum films…”
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    Journal Article
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    Large deformation of thin films and layered flat panels: effects of gravity by Giannakopoulos, A.E, Blech, I.A, Suresh, S

    Published in Acta materialia (26-10-2001)
    “…A general theory is presented for the large deformation of thin films and layered flat panels in which gravitational forces have a marked influence on the…”
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    Journal Article
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    ABCC8 mutation allele frequency in the Ashkenazi Jewish population and risk of focal hyperinsulinemic hypoglycemia by Glaser, Benjamin, Blech, Ilana, Krakinovsky, Yocheved, Ekstein, Josef, Gillis, David, Mazor-Aronovitch, Kineret, Landau, Heddy, Abeliovich, Dvorah

    Published in Genetics in medicine (01-10-2011)
    “…Purpose: Congenital hyperinsulinism of infancy (OMIM# 256450) is a devastating disease most commonly caused by dominant or recessive mutations in either ABCC8…”
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    Journal Article
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    Measurement of stress gradients generated by electromigration by Blech, I. A., Tai, K. L.

    Published in Applied physics letters (15-04-1977)
    “…Stress gradients generated by electromigration in aluminum films were measured at 340 °C. The stresses were measured by combining x-ray topography to record…”
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    Journal Article
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    Reminiscences About a Chemistry Nobel Prize Won with Metallurgy: Comments on D. Shechtman and I. A. Blech; Metall. Trans. A, 1985, vol. 16A, pp. 1005–12 by Blech, Ilan A., Cahn, John W., Gratias, Denis

    “…Blech, Cahn and Gratias detail their involvement in Nobel-prize-winning papers by Dan Schechtman in which the creation by rapid solidification of a sharply…”
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    Journal Article
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    Formation of titanium silicide films by rapid thermal processing by Powell, R.A., Chow, R., Thridandam, C., Fulks, R.T., Blech, I.A., Pan, J.-D.T.

    Published in IEEE electron device letters (01-10-1983)
    “…Titanium silicide thin films, sputter deposited from a composite silicide target, have been rapidly sintered in ∼10 s to produce extremely uniform highly…”
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    Journal Article
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    Chemographic images of silicon surfaces by BLECH, I. A, MEIERAN, E. S

    Published in Applied physics letters (01-01-1983)
    “…Images are obtained when freshly etched or abraded silicon wafers are placed in contact with photographic plates. Based on the study of the images it was…”
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    Journal Article
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    A bridge circuit for the characterization of electrically programmable elements by Shacham-Diamand, Y., Sinar, A., Sirkin, E., Blech, I., Gerzberg, L.

    Published in IEEE journal of solid-state circuits (01-06-1989)
    “…A method for programming and characterizing electrically programmable elements of the antifuse type (i.e normally open) is described. The programming…”
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    Journal Article
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    IPEL-a novel ion-implanted electrically programmable element by Shacham-Diamand, Y., Sinar, A., Sirkin, E., Blech, I., Gerzberg, L.

    Published in IEEE electron device letters (01-05-1989)
    “…The programmable element consists of a metal/amorphous-silicon/crystalline-silicon structure in which the amorphous-silicon layer is created by high-dose ion…”
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    Journal Article
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    Diffusional back flows during electromigration by Blech, I A

    Published in Acta materialia (04-04-1997)
    “…Non-linear drift velocities have been reported when passing electrical currents through short metal lines. The aluminum drift velocity assumes very small…”
    Get full text
    Journal Article
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    The incubation time for hole formation due to electromigration in Al and Al/Cu/Al thin films by Horowitz, S J, Blech, I A

    Published in Journal of electronic materials (01-12-1975)
    “…Transmission electron microscope observations of hole formation in Al and Al/Cu/Al thin film conductors carrying high current densities have revealed the…”
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    Journal Article
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    The electrical properties of ion-implanted amorphous silicon programmable element in the unprogrammed state by Shacham-Diamand, Y., Sinar, A., Sirkin, E.R., Blech, I.A., Gerzberg, L.

    Published in IEEE transactions on electron devices (01-01-1990)
    “…An amorphous silicon layer, confined between metal and single-crystalline silicon, is created by the implantation of ions at high dose into silicon wafers…”
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    Journal Article
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    Estudio preliminar de la creación de una “zona caliente” en YBa2Cu3O7-δ utilizando una corriente continua by Evetts, J. E., Blech, I. A., Vázquez-Navarro, M. D.

    “…This work presents a study of the processes that give rise to the Direct Current Zoning effect. This effect consists in the formation of a hot zone in a…”
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    Journal Article
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    Linear thermal expansion coefficient and biaxial elastic modulus of diamondlike carbon films by Blech, Ilan A., Wood, Peter

    “…Diamondlike carbon films were deposited on silicon, gallium arsenide and aluminum substrates using ion‐assisted chemical vapor deposition. The stress of these…”
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    Journal Article
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