Search Results - "Blakeney, Kyle J."

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  1. 1

    Low Temperature, Selective Atomic Layer Deposition of Nickel Metal Thin Films by Kerrigan, Marissa M, Klesko, Joseph P, Blakeney, Kyle J, Winter, Charles H

    Published in ACS applied materials & interfaces (25-04-2018)
    “…We report the growth of nickel metal films by atomic layer deposition (ALD) employing bis­(1,4-di-tert-butyl-1,3-diazadienyl)­nickel and tert-butylamine as the…”
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    Journal Article
  2. 2

    Axial Composition Gradients and Phase Segregation Regulate the Aspect Ratio of Cu2ZnSnS4 Nanorods by Thompson, Michelle J, Ruberu, T. Purnima A, Blakeney, Kyle J, Torres, Karen V, Dilsaver, Patrick S, Vela, Javier

    Published in The journal of physical chemistry letters (21-11-2013)
    “…Cu2ZnSnS4 (CZTS) is a promising material for solar energy conversion, but synthesis of phase-pure, anisotropic CZTS nanocrystals remains a challenge. We…”
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    Journal Article
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    A Volatile Dialane Complex from Ring Expansion of an N‑Heterocyclic Carbene and Its Use in the Thermal Atomic Layer Deposition of Aluminum Metal Films by Blakeney, Kyle J, Martin, Philip D, Winter, Charles H

    Published in Organometallics (13-04-2020)
    “…Treatment of the stable N-heterocyclic carbene 1,3-di-tert-butylimidazolin-2-ylidene with 2 equiv of AlH3(NMe3) afforded the structurally unusual ring-expanded…”
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    Journal Article
  5. 5

    Cu2ZnSnS4 Nanorods Doped with Tetrahedral, High Spin Transition Metal Ions: Mn2+, Co2+, and Ni2 by Thompson, Michelle J, Blakeney, Kyle J, Cady, Sarah D, Reichert, Malinda D, Pilar-Albaladejo, Joselyn Del, White, Seth T, Vela, Javier

    Published in Chemistry of materials (22-03-2016)
    “…Because of its useful optoelectronic properties and the relative abundance of its elements, the quaternary semiconductor Cu2ZnSnS4 (CZTS) has garnered…”
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    Journal Article
  6. 6

    Thermal atomic layer deposition of tungsten carbide films from WCl6 and AlMe3 by Blakeney, Kyle J., Winter, Charles H.

    “…The atomic layer deposition (ALD) of tungsten carbide films is described with a thermal process employing WCl6 and AlMe3 as precursors. WCl6 has not been…”
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    Journal Article
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