Search Results - "Blaikie, R.J."

Surface charging suppression using PEDOT/PSS in the fabrication of three dimensional structures on a quartz substrate by Mohamed, K., Alkaisi, M.M., Blaikie, R.J.

“…Pattern writing on insulating materials (e.g. quartz) using electron beam lithography (EBL) is a challenging task and it is even more difficult when the…”
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Nanoimprint lithography of sub-100 nm 3D structures by Konijn, M., Alkaisi, M.M., Blaikie, R.J.

“…A simplified method of creating multilevel imprint molds with sub-100 nm dimensions has been developed. The silicon nitride (Si x N y ) molds are patterned in…”
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Selective Filling and Sintering of Copper Nanoclusters for Interconnect by Kheng Chok Tee, Lassesson, A., van Lith, J., Brown, S.A., Partridge, J.G., Schulze, M., Blaikie, R.J.

“…In copper interconnect technology, dielectric trenches are patterned, filled with copper, and polished. We report a cluster-based deposition technology that…”
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Artificial dielectric devices for variable polarization compensation at millimeter and submillimeter wavelengths by Drysdale, T.D., Blaikie, R.J., Chong, H.M.H., Cumming, D.R.S.

“…Variable polarization compensation has been demonstrated at 100 GHz. The device consists of two interlocking V-groove artificial dielectric gratings that…”
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Formation of electrically conducting mesoscale wires through self-assembly of atomic clusters by Partridge, J.G., Scott, S., Dunbar, A.D.F., Schulze, M., Brown, S.A., Wurl, A., Blaikie, R.J.

“…Bi and Sb clusters deposited from an inert gas aggregation source have been used to form cluster-assembled wires on unpassivated, and SiO/sub 2/ passivated,…”
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Performance enhancement of spectral-amplitude-coding optical CDMA using pulse-position modulation by Smith, E.D.J., Blaikie, R.J., Taylor, D.P.

“…Spectral-amplitude-coding optical code-division multiple-access (OCDMA) systems are limited by interference between incoherent sources. A detailed analysis of…”
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Development of Si/SiO2 super-lattices deposited by RF reactive sputtering by Boyd, E., Blaikie, R.J.

“…We report on the progress that has been made on the realisation of narrow spectrum photonic crystal filters operating in the communications band. The…”
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Simulation study of ‘perfect lenses’ for near-field optical nanolithography by Blaikie, R.J., McNab, S.J.

“…Simulation results exploring the use of near field ‘perfect lenses’ (NFPLs) in optical nanolithography are presented. A 40 nm thick silver NFPL 20 nm beneath a…”
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Visualization and measurement of dissolved oxygen concentrations in hydrodynamic flow focusing by Nock, V., Blaikie, R.J.

“…Oxygen is an important parameter with significant effect on cellular development and function. Based on microfluidics, laminar flow and hydrodynamic focusing…”
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A comparison of near-field lithography and planar lens lithography by Melville, D.O.S., Blaikie, R.J., Alkaisi, M.M.

“…The resolution of a near-field lithography technique that uses a planar silver lens to form a near-field image has been investigated and compared with…”
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Teaching integrated circuit and semiconductor device design in New Zealand: the University of Canterbury approach by Blaikie, R.J., Alkaisi, M.M., Durbin, S.M., Cumming, D.R.S.

“…Teaching the practical aspects of device and chip design in New Zealand presents many problems, including high manufacturing costs, long lead times, and the…”
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Analysis of silicon terahertz diffractive optics by Walsby, E.D, Durbin, S.M, Cumming, D.R.S, Blaikie, R.J

“…Simulations of silicon diffractive lenses for terahertz frequencies have been performed using a Fraunhofer wave propagation model to show how the lens…”
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Growth and characterisation of birefringent films on textured silicon substrates by Walsby, E.D., Arnold, M., Wu, Q.-h., Hodgkinson, I.J., Blaikie, R.J.

“…The effects of textured substrates on the serial bi-deposition (SBD) technique of thin film growth have been investigated. Obliquely deposited coatings exhibit…”
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Terahertz tuneable filters made by self-releasing deep dry etch process by Drysdale, T.D., Mills, G., Ferguson, S.M., Blaikie, R.J., Cumming, D.R.S.

“…A novel tuneable filter has been designed for terahertz frequencies, and a self-releasing batch-fabrication process developed for implementing these devices…”
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Low temperature nanoimprint lithography using silicon nitride molds by Alkaisi, M.M., Blaikie, R.J., McNab, S.J.

“…Nanoimprint lithography has been performed at low temperatures using low stress chemical vapour deposited silicon nitride (Si x N y ) as a mold material, with…”
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Templated cluster assembly for production of metallic nanowires in passivated silicon V-grooves by Partridge, J.G., Brown, S.A., Siegert, C., Dunbar, A.D.F., Nielson, R., Kaufmann, M., Blaikie, R.J.

“…Wires with meso-scale and nano-scale widths have been fabricated using a novel templated cluster assembly technique. Soft-landed Sb clusters are assembled into…”
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Fault Models and Device Yield of a Large Population of Room Temperature Operation Single-Electron Transistors by Mazor, D., Bushnell, M.L., Mulligan, D.J., Blaikie, R.J.

“…We improved Smith and Ahmed's nanowire single-electron transistor (SET) to change its operating temperature from 4.2degK to room temperature. We made more than…”
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70 nm Features on 140 nm period using evanescent near field optical lithography by Alkaisi, M.M., Blaikie, R.J., McNab, S.J.

“…We have investigated the resolution limits for Evanescent Near Field Optical Lithography (ENFOL) both experimentally and computationally. Feature sizes as…”
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Multilevel differential polarization shift keying by Blaikie, R.J., Taylor, D.P., Gough, P.T.

“…We analyze the performance of coherent optical communication systems which employ polarization shift keying (PolSK) modulation, introducing for the first time…”
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Nanolithography using optical contact exposure in the evanescent near field by Blaikie, R.J., Alkaisi, M.M., McNab, S.J., Cumming, D.R.S., Cheung, R., Hasko, D.G.

“…Nanolithography has been performed using optical contact exposure in the evanescent near field of an amplitude mask. Low stress silicon nitride membranes are…”
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