Formation of the dendrite structure at ion beam synthesis in the external magnetic field

For the first time the dendrite structure on the surface of single-crystal silicon wafers implanted with Fe+ at high fluences in the applied magnetic field was revealed by atomic-force microscopy. The nucleation and growth of dendrites were simulated using the modified model of the diffusion limited...

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Bibliographic Details
Published in:	Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms Vol. 267; no. 8-9; pp. 1307 - 1310
Main Authors:	Gumarov, G.G., Petukhov, V.Yu, Bukharaev, A.A., Biziaev, D.A., Nuzhdin, V.I., Khaibullin, R.I.
Format:	Journal Article
Language:	English
Published:	Elsevier B.V 01-05-2009
Subjects:	Atomic-force microscopy Dendrite structures Diffusion limited aggregation Dipole–dipole interaction Ion implantation Dipole–dipole interaction 68.37.Ps Ion implantation Atomic-force microscopy Dendrite structures 61.72.U 61.43.Hv Diffusion limited aggregation
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Summary:	For the first time the dendrite structure on the surface of single-crystal silicon wafers implanted with Fe+ at high fluences in the applied magnetic field was revealed by atomic-force microscopy. The nucleation and growth of dendrites were simulated using the modified model of the diffusion limited aggregation at ion implantation. The magnetic dipole–dipole interaction between diffusing implanted atoms and forming ferromagnetic clusters was also considered. In the frame of this model the form of the dendrite structure is mainly determined by the effective magnetic moment and the diffusion coefficient.
Bibliography:	ObjectType-Article-2 SourceType-Scholarly Journals-1 ObjectType-Feature-1 content type line 23
ISSN:	0168-583X 1872-9584
DOI:	10.1016/j.nimb.2009.01.060