Phase-measurement interferometric microscopy of microlithographically fabricated platinum electrodes

Phase-measurement interferometric microscopy of microlithographically fabricated platinum electrodes

Phase-measurement interferometric microscopy (PMIM) was used to measure the topography of Pt microelectrodes fabricated on silicon wafers. Disk (10 {mu}m radius) and band (10 {mu}m {times} 1,000 {mu}m) electrodes were prepared by deposition and lithographic patterning of a 0.2 {mu}m thick SiO{sub 2}...

Full description

Saved in:
Bibliographic Details
Published in:Analytical chemistry (Washington) Vol. 62; no. 11; pp. 1135 - 1138
Main Authors: Smith, Christopher P, Kennedy, Heidi L, Kragt, Harlan J, White, Henry S, Biegen, J. F
Format: Journal Article
Language:English
Published: Washington, DC American Chemical Society 01-06-1990
Subjects:
400201 - Chemical & Physicochemical Properties
ELECTRODES
ELEMENTS
Exact sciences and technology
INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY
Instruments, apparatus, components and techniques common to several branches of physics and astronomy
Interferometers
INTERFEROMETRY
METALS
MICROSCOPY
Optical instruments, equipment and techniques
OPTICAL PROPERTIES
PHYSICAL PROPERTIES
Physics
PLATINUM
PLATINUM METALS
REFRACTIVITY
SEMIMETALS
SILICON
SURFACE PROPERTIES
TRANSITION ELEMENTS
Electrodes
Liquid
Optical microscopy
Phase shifting interferometry
Topography
Air
Metal
Experimental study
Image
Coatings
Optical reflection
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:Phase-measurement interferometric microscopy (PMIM) was used to measure the topography of Pt microelectrodes fabricated on silicon wafers. Disk (10 {mu}m radius) and band (10 {mu}m {times} 1,000 {mu}m) electrodes were prepared by deposition and lithographic patterning of a 0.2 {mu}m thick SiO{sub 2} layer on a 0.05 {mu}m thick Pt film. Quantitative topographical images of the resulting electrodes are obtained from PMIM by accounting for the complex refractive index of Pt and for multiple reflections of light which occur within the transparent SiO{sub 2} layer. In situ, quantitative measurement of microelectrode topography in water is also demonstrated.
Bibliography:istex:9E580CA3988DEB5A44F091154261FE205C18DE86
ark:/67375/TPS-GX1NHX7R-8
ISSN:0003-2700
1520-6882
DOI:10.1021/ac00210a008