Search Results - "Benlahsen, M."

The effect of the terminating bonds on the electronic properties of sputtered carbon nitride thin films by Alibart, F., Peponas, S., Charvet, S., Benlahsen, M.

“…Amorphous carbon nitride films (a-CN x) were grown by reactive radio-frequency magnetron sputtering of a graphite target in an argon/nitrogen gas mixture. The…”
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Exact similarity solutions for forced convection flow over horizontal plate in saturated porous medium with temperature-dependent viscosity by Guedda, M., Benlahsen, M., Sriti, M., Achemlal, D.

“… In this paper, we revisit a mathematical model representing a two-dimensional forced convection boundary-layer flow over a horizontal impermeable plate with…”
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On the post-contamination effect on the delamination of sputtered amorphous carbon nitride films by Peponas, S., Guedda, M., Benlahsen, M.

“…The analysis of post-contamination effect on delamination of amorphous carbon nitride (a- CN x ) films deposited by RF magnetron sputtering of a graphite…”
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Effect of the deposition gas pressure on the structure and mechanical stability of sputtered amorphous carbon nitride films by Peponas, S., Lejeune, M., Charvet, S., Guedda, M., Benlahsen, M.

“…We present in this study spectroscopic investigations of amorphous carbon nitride thin films (a-CNx) deposited on Si substrate by radio-frequency magnetron…”
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Influence of the radio-frequency power on the physical and optical properties of plasma polymerized cyclohexane thin films by Manaa, C., Lejeune, M., Kouki, F., Durand-Drouhin, O., Bouchriha, H., Zellama, K., Benlahsen, M.

“…We investigate in the present study the effects of the radio-frequency plasma power on the opto-electronical properties of the polymeric amorphous hydrogenated…”
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Relationship between the structure and the optical and electrical properties of reactively sputtered carbon nitride films by Alibart, F., Durand Drouhin, O., Debiemme-Chouvy, C., Benlahsen, M.

“…Amorphous carbon nitride films ( CN x ) were grown by reactive radio-frequency (RF) magnetron sputtering of a high-purity graphite target in argon/nitrogen…”
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Effect of the defects on the optical and electronic properties of plasma polymerized organic thin films by Manaa, C., Lejeune, M., Von Bardeleben, H.J., Zellama, K., Bouchriha, H., Benlahsen, M.

“…The microstructure and electronic properties of plasma-polymerized thin films grown by the plasma enhanced chemical vapor deposition (PECVD) method using the…”
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Exact steady states to a nonlinear surface growth model by Guedda, M., Benlahsen, M., Misbah, C.

“…We report on exact stationary solutions to a nonlinear evolution equation describing the collective step meander on a vicinal surface subject to the…”
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The Generalized Blasius equation revisited by Benlahsen, M., Guedda, M., Kersner, R.

“…The main subject of this paper is the model ( | f ″ | n − 1 f ″ ) ′ + 1 n + 1 f f ″ = 0 , f ( 0 ) = f ′ ( 0 ) = 0 , f ′ ( ∞ ) = 1 , arising in the study of a…”
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Spectroscopic investigation of the physicochemical origin of the spontaneous delamination of the sputtered amorphous carbon nitride films by Peponas, S., Guedda, M., Benlahsen, M.

“…We present in this study a spectroscopic investigation of the delamination of the amorphous carbon nitride (a-CN x ) films deposited by RF magnetron sputtering…”
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Stress and structural relaxation in amorphous hydrogenated carbon films by Lejeune, M., Benlahsen, M., Bouzerar, R.

“…The correlation between the residual stress and the atomic-bond structure has been investigated in detail in hydrogenated amorphous films (a-C:H). The…”
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Evolution of the opto-electronic properties of amorphous carbon films as a function of nitrogen incorporation by Alibart, F., Durand Drouhin, O., Lejeune, M., Benlahsen, M., Rodil, S.E., Camps, E.

“…The present work provides correlations between the optical, electronical and microstructural properties of amorphous carbon nitride films (a-CN x ) deposited…”
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Effect of nitrogen on the optoelectronic properties of a highly sp 2-rich amorphous carbon nitride films by Alibart, F., Lejeune, M., Zellama, K., Benlahsen, M.

“…In this study, we investigate the relationship between the nitrogen content and the optoelectronic properties in sputtered amorphous carbon nitride films (a-CN…”
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Effect of nitrogen on the optoelectronic properties of a highly sp2-rich amorphous carbon nitride films by ALIBART, F, LEJEUNE, M, ZELLAMA, K, BENLAHSEN, M

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Comparison and semiconductor properties of nitrogen doped carbon thin films grown by different techniques by Alibart, F., Drouhin, O. Durand, Benlahsen, M., Muhl, S., Rodil, S. Elizabeth, Camps, E., Escobar-Alarcon, L.

“…Amorphous carbon nitride (a-CN x ) thin films have been synthesised by three different deposition techniques in an Ar/N 2 gas mixture and have been deposited…”
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Similarity solutions of a MHD boundary-layer flow past a continuous moving surface by Aly, Emad H., Benlahsen, M., Guedda, M.

“…This note deals with a theoretical and numerical analysis of multiple similarity solutions of the two-dimensional MHD boundary-layer flow over a permeable…”
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Effect of air post contamination on mechanical properties of amorphous carbon nitride thin films by Lejeune, M., Benlahsen, M., Lemoine, P.

“…We report in this study the mechanical, structural and compositional characteristics of amorphous carbon nitride films (a-CN x ) deposited on Si(100) using RF…”
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Structural relaxation of sputtered amorphous carbon nitride films during thermal annealing by Lejeune, M., Benlahsen, M.

“…A study of the stress relaxation caused by post-deposition thermal annealing of carbon nitride thin films (CN x ) deposited onto Si substrates has been carried…”
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Elaboration and electrochemical characterization of nitrogenated amorphous carbon films by Lagrini, A., Deslouis, C., Cachet, H., Benlahsen, M., Charvet, S.

“…Nitrogenated amorphous carbon (a-CN x ) films have been synthesized by a magnetron sputtering technique with a view to prepare improved electrode materials…”
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Internal stress of sputtered amorphous carbon nitride thin films by Durand-Drouhin, O, Benlahsen, M

“…Analysis of amorphous carbon nitride thin films (a-CN x ) deposited by RF magnetron sputtering on (100) silicon wafers under different target self-bias ( V b)…”
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