Search Results - "Ben Giesbers, J."
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1
Nanoscale etching of resists in view of a mechanistic framework
Published in Microelectronic engineering (01-02-1997)“…In our previously developed mechanistic framework for dry etching, the three consecutive reaction steps (reactant chemisorption, surface reaction and product…”
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Journal Article -
2
Classification of impact-assisted etch mechanisms
Published in Microelectronic engineering (01-03-1998)“…Previously, a mechanistic framework has been constructed for impact-assisted etch reactions in e.g. Reactive Ion Etching. The consecutive reaction steps…”
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