Search Results - "Beitia, C."

Metrology for the next generation of semiconductor devices by Orji, N. G., Badaroglu, M., Barnes, B. M., Beitia, C., Bunday, B. D., Celano, U., Kline, R. J., Neisser, M., Obeng, Y., Vladar, A. E.

“…The semiconductor industry continues to produce ever smaller devices that are ever more complex in shape and contain ever more types of materials. The ultimate…”
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FOUP decontamination solutions to control AMCs in semiconductor fabs: Gas purge or wet cleaning? by González-Aguirre, P., Fontaine, H., Moon, S.I., Beitia, C., Lundgren, J., Ohlsen, J.

“…This paper discusses two airborne molecular contaminants (AMCs) decontamination and control solutions for Front Opening Unified Pods (FOUPs), namely, inert gas…”
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Depth profiling investigation by pARXPS and MEIS of advanced transistor technology gate stack by Fauquier, L., Pelissier, B., Jalabert, D., Pierre, F., Gassilloud, R., Doloy, D., Beitia, C., Baron, T.

“…The High-k Metal Gate (HKMG) film stack, introduced since 32nm node of complementary metal oxide semiconductor (CMOS) technology, is one major case where…”
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High resolution nanotopography characterization at die scale of 28 nm FDSOI CMOS front-end CMP processes by Dettoni, F, Rivoire, M, Gaillard, S, Hinsinger, O, Bertin, F, Beitia, C

“…This work concerns high resolution topography characterization at die scale of 28 nm FDSOI CMOS technology by interferometric microscopy. It shows that usual…”
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Theoretical and Experimental Optical Spectroscopy Study of Hydrogen Adsorption at Si(111)-(7 x 7) by Noguez, C, Beitia, C, Preyss, W, Shkrebtii, AI, Roy, M, Borensztein, Y, Del Sole R

“…The combination of in situ real-time surface differential reflectivity (SDR) spectroscopy and microscopic calculations has been used for the first time to…”
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In-line characterization of dielectric constant and leakage currents of low-k films with corona charge method by Fossati, D., Beitia, C., Plantier, L., Imbert, G., Passefort, S., Desbois, M., Volpi, F., Royer, J.-C.

“…The use of corona charge method for monitoring the electrical properties of low-k dielectrics is investigated in this paper. First, the stability and…”
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Adsorption kinetics of H on Si(111)7×7 by means of surface differential reflectivity by Beitia, C., Preyss, W., Del Sole, R., Borensztein, Y.

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Formation and stability of small particles of potassium studied by real-time surface differential reflectance by Beitia, C, Borensztein, Y

“…The growth of K particles on SiO 2 is investigated by real-time surface differential reflectance spectroscopy. The K clusters give rise to a strong optical…”
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Optical profilometry and AFM measurements comparison on low amplitude deterministic surfaces by Beitia, C., Abdel sater, M., Cordeau, M., Godny, S., Petitgrand, S., Alliata, D.

“…Surface nanotopography is important for different key advanced process steps (CMP, Bonding, Epitaxy...). However, its characterization needs data at all scales…”
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Benefits of XPS nanocharacterization for process development and industrial control of thin SiGe channel layers in advanced CMOS technologies by Fauquier, L., Pelissier, B., Jalabert, D., Pierre, F., Hartmann, J.M., Rozé, F., Doloy, D., Le Cunff, D., Beitia, C., Baron, T.

“…The Si channel of advanced p-type transistors has been replaced by a compressively strained Silicon-Germanium channel (SiGe) in order to improve the device…”
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Optical spectroscopy study of hydrogenation of the Si(111)-7 × 7 surface by Roy, M., Beitia, C., Borensztein, Y., Shkrebtii, A., Noguez, C., Del Sole, R.

“…Deposition of foreign atoms on silicon surfaces gives rise to a variety of phenomena, which are the subject of very active research. Fundamentally and…”
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High resolution nanotopography characterization at die scale of 28nm FDSOI CMOS front-end CMP processes by Dettoni, F., Rivoire, M., Gaillard, S., Hinsinger, O., Bertin, F., Beitia, C.

“…•T-boxes are not representative of the die topography.•Full die range is not the most representative die value.•Full die and die σ ranges provide new and…”
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Epidemiological and clinical characteristics and the approach to infant chickenpox in primary care by Rodriguez-Santana, Yessica, Sanchez-Almeida, Elena, Garcia-Vera, Cesar, Garcia-Ventura, Maria, Martinez-Espligares, Laura

“…Chickenpox is not common in the first year of life (infant varicella) and there is a lack of data on its presentation, especially in primary care. A year-long…”
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High resolution nanotopography characterization at die scale of 28 nm FDSOI CMOS front-end CMP processes by DETTONI, F, RIVOIRE, M, GAILLARD, S, HINSINGER, O, BERTIN, F, BEITIA, C

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Publisher Correction: Metrology for the next generation of semiconductor devices by Orji, N. G., Badaroglu, M., Barnes, B. M., Beitia, C., Bunday, B. D., Celano, U., Kline, R. J., Neisser, M., Obeng, Y., Vladar, A. E.

“…In the version of this Review Article originally published, the labelling of the reflected beam in Fig. 4a was incorrect. This has now been corrected in the…”
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Real-Time Investigation of Potassium Growth by Surface Differential Reflectance Spectroscopy by Borensztein, Y., Beitia, C., Barrera, R.G.

“…The growth of potassium discontinuous films onto a low‐temperature oxidized silicon substrate has been followed in real‐time by surface differential…”
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Substrate-induced multipolar resonances in supported free-electron metal spheres by Beitia, C., Borensztein, Y., Lazzari, R., Nieto, Juanjo, Barrera, R. G.

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Formation and stability of small particles of potassium studied by real-time surface differential reflectance by Borensztein, Y, Beitia, C

“…The growth of K particles on SiO sub 2 is investigated by real-time surface differential reflectance spectroscopy. The K clusters give rise to a strong optical…”
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1μm Pitch direct hybrid bonding with <300nm wafer-to-wafer overlay accuracy by Jouve, A., Balan, V., Bresson, N., Euvrard-Colnat, C., Fournel, F., Exbrayat, Y., Mauguen, G., Sater, M. Abdel, Beitia, C., Arnaud, L., Cheramy, S., Lhostis, S., Farcy, A., Guillaumet, S., Mermoz, S.

“…Copper/oxide hybrid bonding process has been extensively studied these past years as a key enabler for 3D high density application with top and bottom tier…”
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In-line characterization of dielectric constant and leakage currents of low-k films with corona charge method by Fossati, D., Beitia, C., Plantier, L., Imbert, G., Passefort, S., Desbois, M., Volpi, F., C. Royer, J.

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