Search Results - "Bay, H L"

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    Epitaxial growth and characterization of Fe thin films on wurtzite GaN(0 0 0 1) by Meijers, R., Calarco, R., Kaluza, N., Hardtdegen, H., Ahe, M.v.d., Bay, H.L., Lüth, H., Buchmeier, M., Bürgler, D.E.

    Published in Journal of crystal growth (01-10-2005)
    “…Fe films of different thicknesses were deposited on wurtzite GaN(0 0 0 1) layers by electron beam evaporation. They were studied by a number of…”
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    Influence of the reactor inlet configuration on the AlGaN growth efficiency by Yakovlev, E.V., Talalaev, R.A., Kaluza, N., Hardtdegen, H., Bay, H.L.

    Published in Journal of crystal growth (2007)
    “…This paper discusses the results of a combined modeling and experimental analysis of AlGaN deposition in the horizontal two-flow AIX 200/4 RF-S reactor. The…”
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    MBE growth and characterization of buried silicon oxide films on Si(100) by Hacke, M., Bay, H.L., Mantl, S.

    Published in Thin solid films (01-07-1996)
    “…Silicon molecular beam epitaxy (Si-MBE) has been used to produce silicon oxide (SiO x ) films by evaporating Si on a heated Si(100) substrate in an ultra high…”
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    New method for the in situ determination of Alx Ga1-x N composition in MOVPE by real-time optical reflectance by Hardtdegen, H., Kaluza, N., Sofer, Z., Cho, Y. S., Steins, R., Bay, H. L., Dikme, Y., Kalisch, H., Jansen, R. H, Heuken, M., Strittmatter, A., Reißmann, L., Bimberg, D., Zettler, J.-T.

    “…This paper reports on the in situ determination of the Al‐content in Alx Ga1–x N layers deposited by MOVPE on sapphire and silicon substrates by means of…”
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    New method for epitaxial heterostructure layer growth by MANTL, S, BAY, H. L

    Published in Applied physics letters (20-07-1992)
    “…A new method for the fabrication of compound thin films inside single-crystalline matrices is demonstrated. It differs from all known techniques by the…”
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    Patterning method for silicides based on local oxidation by Mantl, S., Dolle, M., Mesters, St, Fichtner, P. F. P., Bay, H. L.

    Published in Applied physics letters (04-12-1995)
    “…Oxidation of CoSi2 layers on Si(100) using oxidation masks has been investigated. It is shown that local oxidation can be used to pattern the silicide layer…”
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