Deposition of cobalt oxide thin films by plasma-enhanced chemical vapour deposition (PECVD) for catalytic applications

Plasma-enhanced chemical vapour deposition (PECVD) was used to prepare thin films of cobalt oxide. Cobalt oxide-based (CoO and Co3O4) catalysts were chosen due to their efficiency in mineralisation of organic pollutants achieved by catalytic ozonation. In this work, two types of PECVD processes were...

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Bibliographic Details
Published in:	Surface & coatings technology Vol. 206; no. 7; pp. 1673 - 1679
Main Authors:	Guyon, C., Barkallah, A., Rousseau, F., Giffard, K., Morvan, D., Tatoulian, M.
Format:	Journal Article Conference Proceeding
Language:	English
Published:	Amsterdam Elsevier B.V 25-12-2011 Elsevier
Subjects:	Catalysis Catalysts Chemical vapor deposition Coatings Cobalt Cobalt oxides Cobalt-organic composite thin film Cross-disciplinary physics: materials science; rheology Exact sciences and technology Materials science Methods of deposition of films and coatings; film growth and epitaxy MOPECVD Ozonation catalysis Physics Plasma deposition Plasma enhanced chemical vapor deposition Surface treatments Thin films Cobalt oxides Ozonation catalysis MOPECVD Cobalt-organic composite thin film Plasma deposition Cobalt oxide Plasma Oxide layer Surface treatments Thin films CVD Composite materials Chemical deposition Oxidation Catalysis Application
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Summary:	Plasma-enhanced chemical vapour deposition (PECVD) was used to prepare thin films of cobalt oxide. Cobalt oxide-based (CoO and Co3O4) catalysts were chosen due to their efficiency in mineralisation of organic pollutants achieved by catalytic ozonation. In this work, two types of PECVD processes were used for the production of cobalt oxide thin films. In the first one, a solution of nitrate salt of cobalt was sprayed into a RF low pressure plasma discharge (40MHz, 600Pa, 200W) to obtain CoxOy layers. In the second MOPECVD (metal organic plasma-enhanced chemical vapour deposition) process, cobalt oxide thin films were deposited using a capacitive coupled external electrodes RF plasma reactor (13.56MHz, 100Pa, 200W) with cobalt carbonyl Co2(CO)8 dissolved in hexene as precursor sprayed in a gas carrier (argon and oxygen). In the case of coatings produced from a solution of cobalt nitrate salt, a layer of 1μm of Co3O4 in crystalline form was obtained after annealing. Considering the thin films obtained from cobalt carbonyl precursor, analyses confirmed the presence of cobalt oxide in a polymeric layer on the surface of the substrate. XRD investigation showed the presence of a crystalline phase of Co3O4 (crystallite size of about 40nm).
Bibliography:	ObjectType-Article-2 SourceType-Scholarly Journals-1 ObjectType-Feature-1 content type line 23
ISSN:	0257-8972 1879-3347
DOI:	10.1016/j.surfcoat.2011.09.060