Search Results - "Bakhturova, L. F."
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Plasma Deposition and Properties of Silicon Carbonitride Films
Published in Inorganic materials (01-07-2005)“…A variety of advanced analytical techniques were used to characterize silicon carbonitride films grown from new volatile nitrogen-rich silyl derivatives of…”
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Plasma-chemical deposition of SiCN films from volatile N-bromhexamethyldisilazane
Published in Inorganic materials (01-12-2008)“…Process of silicon-carbonitride (SiCN) film production from a new volatile organosilicon, N-bromhexamethyldisilazane, is developed. The use of this chemical…”
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Relative Contributions of Plasma Pyrolysis and Liquid-Phase Reactions in the Anode Microspark Treatment of Aqueous Phenol Solutions
Published in High energy chemistry (01-03-2004)Get full text
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The role of electrolyte concentration in the decomposition of water and generation of electrons under conditions of anodic microdischarges
Published in High energy chemistry (01-03-2005)Get full text
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Plasma electroradiolysis of aqueous solutions
Published in High energy chemistry (01-05-2009)“…Electroradiolysis of aqueous solutions, a process that is induced by the action of glow discharge on an electrolytic cathode, is considered. The results of…”
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Electron emission at the gas discharge plasma/electrolytic cathode interface
Published in High energy chemistry (01-11-2007)Get full text
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Conversion factors for evaluation of power yields for electrolytic-cathode discharge
Published in High energy chemistry (01-05-2008)Get full text
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New technique for heterogeneous vapor-phase synthesis of nanostructured metal layers from low-dimensional volatile metal complexes
Published in Technical physics (01-09-2011)“…A new technique for depositing thin nanostructured layers on semiconductor and insulating substrates that is based on heterogeneous gas-phase synthesis from…”
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Formation of thin nanostructured layers during heterogeneous gas-phase synthesis from small-size volatile metal complexes on the surface of semiconductors and dielectrics
Published in Technical physics letters (01-03-2010)“…We have developed and verified a new method for the formation of thin nanostructured layers on semiconductor and dielectric substrates by heterogeneous…”
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On the mechanism of remote plasma-enhanced chemical vapor deposition of films
Published in High energy chemistry (01-07-2008)Get full text
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Molar extinction coefficients of IR absorption bands of Cu(II) dipivaloylmethanate
Published in Journal of applied spectroscopy (01-01-2000)Get full text
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Molar coefficients of extinction for IR absorption bands of Ni(II) acetylacetonate, ketoiminate, and trifluoroacetylacetonate
Published in Journal of applied spectroscopy (01-09-1998)Get full text
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Chemical vapor deposition of Y2O3 films using Y(dpm)3
Published in Inorganic materials (2002)Get full text
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