Search Results - "Bakhturova, L. F."

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    Plasma Deposition and Properties of Silicon Carbonitride Films by Smirnova, T. P., Badalyan, A. M., Borisov, V. O., Kaichev, V. V., Bakhturova, L. F., Kichai, V. N., Rakhlin, V. I., Shainyan, B. A.

    Published in Inorganic materials (01-07-2005)
    “…A variety of advanced analytical techniques were used to characterize silicon carbonitride films grown from new volatile nitrogen-rich silyl derivatives of…”
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    Journal Article
  2. 2

    Plasma-chemical deposition of SiCN films from volatile N-bromhexamethyldisilazane by Smirnova, T. P., Badalian, A. M., Borisov, V. O., Bakhturova, L. F., Kaichev, V. V., Podgorbunskaya, T. A., Rakhlin, V. I.

    Published in Inorganic materials (01-12-2008)
    “…Process of silicon-carbonitride (SiCN) film production from a new volatile organosilicon, N-bromhexamethyldisilazane, is developed. The use of this chemical…”
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    Journal Article
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    Plasma electroradiolysis of aqueous solutions by Polyakov, O. V., Badalyan, A. M., Bakhturova, L. F.

    Published in High energy chemistry (01-05-2009)
    “…Electroradiolysis of aqueous solutions, a process that is induced by the action of glow discharge on an electrolytic cathode, is considered. The results of…”
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    New technique for heterogeneous vapor-phase synthesis of nanostructured metal layers from low-dimensional volatile metal complexes by Badalyan, A. M., Bakhturova, L. F., Kaichev, V. V., Polyakov, O. V., Pchelyakov, O. P., Smirnov, G. I.

    Published in Technical physics (01-09-2011)
    “…A new technique for depositing thin nanostructured layers on semiconductor and insulating substrates that is based on heterogeneous gas-phase synthesis from…”
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    Formation of thin nanostructured layers during heterogeneous gas-phase synthesis from small-size volatile metal complexes on the surface of semiconductors and dielectrics by Badalyan, A. M., Bakhturova, L. F., Kaichev, V. V., Kashnikov, B. P., Polyakov, O. V., Pchelyakov, O. P., Smirnov, G. I.

    Published in Technical physics letters (01-03-2010)
    “…We have developed and verified a new method for the formation of thin nanostructured layers on semiconductor and dielectric substrates by heterogeneous…”
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    Journal Article
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