Search Results - "Bacuita, Terence"
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Exposing extreme ultraviolet lithography at Intel
Published in Microelectronic engineering (01-04-2006)“…In this paper we present the latest results on developing and integrating extreme ultraviolet lithography (EUVL) at Intel. The world’s first commercial EUV…”
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Journal Article Conference Proceeding -
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Effects of flare in extreme ultraviolet lithography: Learning from the engineering test standa
Published in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures (01-11-2004)“…One of the technical challenges for introducing extreme ultraviolet lithography (13.5 nm) into high volume manufacturing is flare. Flare reduces aerial image…”
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Journal Article