Search Results - "Baboux, Nicolas"
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Characterization of ferroelectric hafnium/zirconium oxide solid solutions deposited by reactive magnetron sputtering
Published in Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures (01-03-2019)“…The room temperature deposition of 10 nm-thick ferroelectric hafnium/zirconium oxide, (Hf, Zr)O 2 , thin solid films is achieved with a single…”
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Interpretation of multiscale characterization techniques to assess ferroelectricity: The case of GaFeO3
Published in Ultramicroscopy (01-01-2017)“…In this paper, we propose a thorough experimental procedure to assess the ferroelectricity of thin films, and apply this procedure to Pulsed Laser Deposition…”
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Electromechanical response of amorphous LaAlO3 thin film probed by scanning probe microscopies
Published in Applied physics letters (07-07-2014)“…The electromechanical response of a 3 nm thick amorphous LaAlO3 layer obtained by molecular beam epitaxy has been studied using scanning probe microscopies…”
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Dramatic impact of pressure and annealing temperature on the properties of sputtered ferroelectric HZO layers
Published in APL materials (01-08-2019)“…The crystallization of ferroelectric (Hf,Zr)O2 thin films is achieved by playing on the deposition pressure during reactive magnetron sputtering from a Hf/Zr…”
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Huge gain in pyroelectric energy conversion through epitaxy for integrated self-powered nanodevices
Published in Nano energy (01-11-2017)“…Polycrystalline (textured) and epitaxial 500nm thick Pb(Zr0.52Ti0.48)O3 (PZT) layers have been monolithically integrated in metal-insulator-metal structure on…”
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Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
Published in Journal of vacuum science & technology. A, Vacuum, surfaces, and films (01-01-2014)“…The development of metallic single electron transistor (SET) depends on the downscaling and the electrical properties of its tunnel junctions. These tunnel…”
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Static and Dynamic Modeling of Single-Electron Memory for Circuit Simulation
Published in IEEE transactions on electron devices (01-01-2012)“…Two compact models for single-electron memory (SEM) are proposed and validated by comparisons with the program SIMON. The approach is based on the master…”
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Huge Reduction of the Wake-Up Effect in Ferroelectric HZO Thin Films
Published in ACS applied electronic materials (24-09-2019)“…The wake-up effect is a major issue for ferroelectric HfO2-based memory devices. Here, two TiN/HZO/TiN structures deposited by magnetron sputtering on silicon…”
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High Spatial Resolution Thermal Mapping of Volatile Switching in NbOx-Based Memristor Using In Situ Scanning Thermal Microscopy
Published in ACS applied materials & interfaces (29-06-2022)Get full text
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Physical Origin of Negative Differential Resistance in V3O5 and Its Application as a Solid‐State Oscillator
Published in Advanced materials (Weinheim) (23-02-2023)“…Oxides that exhibit an insulator–metal transition can be used to fabricate energy‐efficient relaxation oscillators for use in hardware‐based neural networks…”
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Electrical properties of Molecular Beam Epitaxy grown Barium Titanate probed by conductive Atomic Force Microscopy
Published in Thin solid films (30-11-2017)“…The electrical properties of Barium Titanate 60nm thick layers grown by Molecular Beam Epitaxy has been probed at the nanoscale by Conductive-Atomic Force…”
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Biorealistic Neuronal Temperature-Sensitive Dynamics within Threshold Switching Memristors: Toward Neuromorphic Thermosensation
Published in ACS applied materials & interfaces (19-06-2024)“…Neuromorphic nanoelectronic devices that can emulate the temperature-sensitive dynamics of biological neurons are of great interest for bioinspired robotics…”
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High Spatial Resolution Thermal Mapping of Volatile Switching in NbO x ‑Based Memristor Using In Situ Scanning Thermal Microscopy
Published in ACS applied materials & interfaces (29-06-2022)“…Temperature mapping by in situ thermoreflectance thermal imaging (TRTI) or midwave infrared spectroscopy has played an important role in understanding the…”
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Physical Origin of Negative Differential Resistance in V 3 O 5 and Its Application as a Solid-State Oscillator
Published in Advanced materials (Weinheim) (01-02-2023)“…Oxides that exhibit an insulator-metal transition can be used to fabricate energy-efficient relaxation oscillators for use in hardware-based neural networks…”
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Programming multilevel crystallization states in phase-change-material thin films
Published in Optical materials express (01-11-2023)“…We propose and demonstrate a simple method to accurately monitor and program arbitrary states of partial crystallization in phase-change materials (PCMs). The…”
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Insertion of an Ultra‐thin Interfacial Aluminium Layer for the Realisation of a Hf0.5Zr0.5O2 Ferroelectric Tunnel Junction
Published in Physica status solidi. PSS-RRL. Rapid research letters (01-10-2022)“…Herein, the effect of a 2 nm thin aluminum layer inserted between the ferroelectric layer and the top electrode in a TiN/Hf0.5Zr0.5O2/TiN stack deposited by…”
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Ferroelectricity Improvement in Ultra‐Thin Hf0.5Zr0.5O2 Capacitors by the Insertion of a Ti Interfacial Layer
Published in Physica status solidi. PSS-RRL. Rapid research letters (01-10-2022)“…Ultra‐Thin Hf0.5Zr0.5O2 Capacitors Through interface engineering, Greta Segantini and co‐workers improve ferroelectricity and scalability of hafnium zirconium…”
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Reversible Single‐Pulse Laser‐Induced Phase Change of Sb 2 S 3 Thin Films: Multi‐Physics Modeling and Experimental Demonstrations
Published in Advanced optical materials (01-10-2024)“…Phase change materials (PCMs) have gained a tremendous interest as a means to actively tune nanophotonic devices through the large optical modulation produced…”
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Insertion of an Ultrathin Interfacial Aluminum Layer for the Realization of a Hf0.5Zr0.5O2 Ferroelectric Tunnel Junction
Published in Physica status solidi. PSS-RRL. Rapid research letters (01-10-2022)“…Herein, the effect of a 2 nm thin aluminum layer inserted between the ferroelectric layer and the top electrode in a TiN/Hf0.5Zr0.5O2/TiN stack deposited by…”
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