Thermal stability of Co/Si/W/Si multilayers
The thermal stability of Co/Si/W/Si multilayers (MLs) was investigated by X-ray diffraction and reflectivity, magnetization and magnetoresistance experiments. The Co/Si/W/Si ML with Co layers 2.1 nm thick persists up to 850°C/30 s annealing without change of the ML period. The increased stability is...
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| Published in: | Journal of magnetism and magnetic materials Vol. 156; no. 1-3; pp. 415 - 416 |
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| Main Authors: | , , , , , , |
| Format: | Journal Article |
| Language: | English |
| Published: |
Elsevier B.V
01-04-1996
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| Online Access: | Get full text |
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| Summary: | The thermal stability of Co/Si/W/Si multilayers (MLs) was investigated by X-ray diffraction and reflectivity, magnetization and magnetoresistance experiments. The Co/Si/W/Si ML with Co layers 2.1 nm thick persists up to 850°C/30 s annealing without change of the ML period. The increased stability is correlated with the absence of magnetic Co phase and with the presence of amorphous Co-Si mixture formed during the deposition. |
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| Bibliography: | SourceType-Scholarly Journals-2 ObjectType-Feature-2 ObjectType-Conference Paper-1 content type line 23 SourceType-Conference Papers & Proceedings-1 ObjectType-Article-3 |
| ISSN: | 0304-8853 |
| DOI: | 10.1016/0304-8853(95)00920-5 |