Search Results - "Babayan, S.E."

The atmospheric-pressure plasma jet: a review and comparison to other plasma sources by Schutze, A., Jeong, J.Y., Babayan, S.E., Jaeyoung Park, Selwyn, G.S., Hicks, R.F.

“…Atmospheric-pressure plasmas are used in a variety of materials processes. Traditional sources include transferred arcs, plasma torches, corona discharges, and…”
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Etching polyimide with a nonequilibrium atmospheric-pressure plasma jet by Jeong, J. Y., Babayan, S. E., Schütze, A., Tu, V. J., Park, J., Henins, I., Selwyn, G. S., Hicks, R. F.

“…An atmospheric-pressure plasma jet has been used to etch polyimide films at 1.0–8.0±0.2 μ m/min at 760 Torr and between 50 and 250 °C. The plasma was produced…”
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Etching of uranium oxide with a non-thermal, atmospheric pressure plasma by Yang, X., Moravej, M., Babayan, S.E., Nowling, G.R., Hicks, R.F.

“…The etching of uranium oxide films was investigated with a non-thermal, atmospheric pressure plasma fed with a mixture of 2.0 kPa carbon tetrafluoride, 880.0…”
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Determination of the Nitrogen Atom Density in the Afterglow of a Nitrogen and Helium, Nonequilibrium, Atmospheric Pressure Plasma by Babayan, S.E., Ding, G., Hicks, R.F.

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Characterization of the Active Species in the Afterglow of a Nitrogen and Helium Atmospheric-Pressure Plasma by Babayan, S.E., Ding, G., Nowling, G.R., Yang, X., Hicks, R.F.

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Tantalum etching with a nonthermal atmospheric-pressure plasma by Tu, V. J., Jeong, J. Y., Schütze, A., Babayan, S. E., Ding, G., Selwyn, G. S., Hicks, R. F.

“…Tantalum was etched in a downstream, atmospheric-pressure plasma. In this process, etching occurred without significant ion bombardment. An etching rate of…”
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