Search Results - "Avrutin, V.S."
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Low-temperature strain relaxation in SiGe/Si heterostructures implanted with Ge + ions
Published in Materials science & engineering. B, Solid-state materials for advanced technology (15-06-2003)“…Pseudomorphic Si 0.76Ge 0.24/Si heterostructures grown by molecular beam epitaxy were implanted with Ge + ions at 400 °C in such a way that an ion-damaged…”
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2
Low-temperature strain relaxation in ion-irradiated pseudomorphic SiGe/Si structures
Published in Materials science & engineering. B, Solid-state materials for advanced technology (14-02-2002)“…The effect of non-equilibrium point defects on strain relaxation in pseudomorphic Si 0.76Ge 0.24/Si heterostructures was studied by X-ray diffraction (XRD) and…”
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3
Effect of annealing environment on antimony redistribution in pseudomorphic Si/SiGe/Si〈Sb〉 heterostructures
Published in Materials science & engineering. B, Solid-state materials for advanced technology (14-02-2002)“…Sb redistribution in an MBE-grown strained Si/Si 0.85Ge 0.15/Si〈Sb〉 heterostructure was studied by secondary ion mass-spectrometry. Two types of annealing…”
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4
Silicon molecular beam epitaxial growth on ultra-small mesa structures
Published in Journal of crystal growth (01-12-1995)“…The effect of temperature and deposition rate on faceting of local silicon epitaxial structures in the temperature range 450–900°C was studied. Epitaxial…”
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Causes of cracking of vacuum deposited thick amorphous silicon film
Published in Materials science & engineering. B, Solid-state materials for advanced technology (01-05-1996)“…Cracking of thick amorphous silicon films deposited in ultra high vacuum on crystalline substrates was investigated. It was found that microvoids occurring in…”
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Ion beam induced strain relaxation in pseudomorphous epitaxial SiGe layers
Published in 2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 (Cat. No.00EX432) (2000)“…The effects of irradiation with Ge/sup +/ and Ar/sup +/ ions at elevated temperatures on the relaxation behavior of pseudomorphic Si/sub 0.79/Ge/sub 0.21//Si…”
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