Atoms-to-circuits simulation investigation of CNT interconnects for next generation CMOS technology
In this study, we suggest a hierarchical model to investigate the electrical performance of carbon nanotube (CNT)- based interconnects. From the density functional theory, we have obtained important physical parameters, which are used in TCAD simulators to obtain the RC netlists. We then use these R...
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Published in: | 2017 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) pp. 153 - 156 |
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Main Authors: | , , , , , , , , , , , |
Format: | Conference Proceeding |
Language: | English |
Published: |
The Japan Society of Applied Physics
01-09-2017
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Subjects: | |
Online Access: | Get full text |
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Summary: | In this study, we suggest a hierarchical model to investigate the electrical performance of carbon nanotube (CNT)- based interconnects. From the density functional theory, we have obtained important physical parameters, which are used in TCAD simulators to obtain the RC netlists. We then use these RC netlists for the circuit-level simulations to optimize interconnect design in VLSI. Also, we have compared various CNT-based interconnects such as single-walled CNTs, multi-walled CNTs, doped CNTs, and Cu-CNT composites in terms of conductivity, ring oscillator delay, and propagation time delay. |
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ISBN: | 4863486111 9784863486119 |
ISSN: | 1946-1569 1946-1577 |
DOI: | 10.23919/SISPAD.2017.8085287 |