Atoms-to-circuits simulation investigation of CNT interconnects for next generation CMOS technology

In this study, we suggest a hierarchical model to investigate the electrical performance of carbon nanotube (CNT)- based interconnects. From the density functional theory, we have obtained important physical parameters, which are used in TCAD simulators to obtain the RC netlists. We then use these R...

Full description

Saved in:
Bibliographic Details
Published in:2017 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) pp. 153 - 156
Main Authors: Jaehyun Lee, Jie Liang, Amoroso, Salvatore M., Sadi, Toufik, Liping Wang, Asenov, Flamen, Pender, Andrew, Reid, Dave T., Georgiev, Vihar P., Millar, Campbell, Todri-Sanial, Aida, Asenov, Asen
Format: Conference Proceeding
Language:English
Published: The Japan Society of Applied Physics 01-09-2017
Subjects:
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:In this study, we suggest a hierarchical model to investigate the electrical performance of carbon nanotube (CNT)- based interconnects. From the density functional theory, we have obtained important physical parameters, which are used in TCAD simulators to obtain the RC netlists. We then use these RC netlists for the circuit-level simulations to optimize interconnect design in VLSI. Also, we have compared various CNT-based interconnects such as single-walled CNTs, multi-walled CNTs, doped CNTs, and Cu-CNT composites in terms of conductivity, ring oscillator delay, and propagation time delay.
ISBN:4863486111
9784863486119
ISSN:1946-1569
1946-1577
DOI:10.23919/SISPAD.2017.8085287