Search Results - "Arnold, William H"

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  1. 1

    Limited Impact of Sustained Simple Feedback Based on Soap and Paper Towel Consumption on the Frequency of Hand Washing in an Adult Intensive Care Unit by Bittner, Marvin J., Rich, Eugene C., Turner, Paul D., Arnold, William H.

    “…To determine whether hand washing would increase with sustained feedback based on measurements of soap and paper towel consumption. Prospective trial with a…”
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    Journal Article
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    CMOS device fabrication and the evolution of optical lithographic exposure tools by Arnold, William H

    Published in Microelectronic engineering (1999)
    “…Advances in the performance of integrated circuits have long been fuelled by continuing progress in microlithography. For at least thirty years, the minimum…”
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    Journal Article Conference Proceeding
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    Synthesis of 2‘-O-Benzoyl-3-keto-6-O-propargyl-11,12-carbamoyl Erythromycin A by Kerdesky, Francis A. J, Premchandran, Ramiya, Wayne, Gregory S, Chang, Sou-Jen, Pease, Jonathan P, Bhagavatula, Lakshmi, Lallaman, John E, Arnold, William H, Morton, Howard E, King, Steven A

    Published in Organic process research & development (01-11-2002)
    “…An efficient and practical synthesis of 2‘-O-benzoyl-3-keto-6-O-propargyl-11,12-carbamoyl erythromycin A (4) is described. The semisynthetic macrolide was…”
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    Journal Article
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    Focus: The critical parameter for submicron lithography by Levinson, Harry J., Arnold, William H.

    “…A simple model of the photolithographic process is used to analyze the effects of defocus on resist profiles and process control. An expression is obtained for…”
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    Journal Article
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    Challenges for Lithography Scaling to 32nm and Below by Arnold, W.H.

    “…Microlithography continues to enable device scaling and manufacturing of high speed microprocessors, high density flash and DRAM memories, as well as SoCs and…”
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    Conference Proceeding
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    Atomic force microscopy for cross section inspection and metrology by Wilder, Kathryn, Quate, Calvin F., Singh, Bhanwar, Alvis, Roger, Arnold, William H.

    “…Images of integrated circuit cross sections may be acquired with the atomic force microscope (AFM) by introducing material‐dependent topography through a…”
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    Conference Proceeding
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