Search Results - "Apostolico, Leonardo"

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  1. 1
    Titanium Phosphide Coatings from the Atmospheric Pressure Chemical Vapor Deposition of TiCl4 and RPH2 (R = t-Bu, Ph, CyHex)

    Titanium Phosphide Coatings from the Atmospheric Pressure Chemical Vapor Deposition of TiCl4 and RPH2 (R = t-Bu, Ph, CyHex) by Blackman, Chris, Carmalt, Claire J., Parkin, Ivan P., Apostolico, Leonardo, Molloy, Kieran C., Rushworth, Simon

    Published in Chemistry of materials (15-07-2002)
    “…Atmospheric pressure chemical vapor deposition of titanium phosphide coatings was achieved on glass substrates from the reaction of TiCl4 and RPH2 (R = t-Bu,…”
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  2. 2
    Atmospheric-Pressure Chemical Vapor Deposition of Group IVb Metal Phosphide Thin Films from Tetrakisdimethylamidometal Complexes and Cyclohexylphosphine

    Atmospheric-Pressure Chemical Vapor Deposition of Group IVb Metal Phosphide Thin Films from Tetrakisdimethylamidometal Complexes and Cyclohexylphosphine by Blackman, Christopher S, Carmalt, Claire J, O'Neill, Shane A, Parkin, Ivan P, Apostolico, Leonardo, Molloy, Kieran C

    Published in Chemistry of materials (23-03-2004)
    “…The dual-source atmospheric-pressure chemical vapor deposition of group IVb metal phosphide films from tetrakisdimethylamido(metal) and cyclohexylphosphine…”
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  3. 3
    The reaction of GeCl4 with primary and secondary phosphines

    The reaction of GeCl4 with primary and secondary phosphines by Apostolico, Leonardo, Mahon, Mary F, Molloy, Kieran C, Binions, Russell, Blackman, Christopher S, Carmalt, Claire J, Parkin, Ivan P

    “…Reaction of GeCl4 and CyPH2 leads to a range of products from which crystals of [CyPH3]+[GeCl3]- have been obtained. The major intermediate in this reaction,…”
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  4. 4
    The synthesis and characterization of novel precursors for the CVD of main group metal phosphides

    The synthesis and characterization of novel precursors for the CVD of main group metal phosphides by Apostolico, Leonardo

    Published 01-01-2003
    “…The syntheses and characterizations of germanium and tin compounds as novel single-source precursors for the deposition and growth of thin films of metal…”
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  5. 5
    Low temperature deposition of crystalline chromium phosphide films using dual-source atmospheric pressure chemical vapour deposition

    Low temperature deposition of crystalline chromium phosphide films using dual-source atmospheric pressure chemical vapour deposition by Blackman, Christopher S, Carmalt, Claire J, Manning, Troy D, Parkin, Ivan P, Apostolico, Leonardo, Molloy, Kieran C

    Published in Applied surface science (30-06-2004)
    “…Thin films of crystalline chromium phosphide (CrP) have been produced from the dual-source atmospheric pressure CVD reaction of chromium hexacarbonyl and…”
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  6. 6
    Titanium Phosphide Coatings from the Atmospheric Pressure Chemical Vapor Deposition of TiCl 4 and RPH 2 (R = t -Bu, Ph, Cy H ex )

    Titanium Phosphide Coatings from the Atmospheric Pressure Chemical Vapor Deposition of TiCl 4 and RPH 2 (R = t -Bu, Ph, Cy H ex ) by Blackman, Chris, Carmalt, Claire J., Parkin, Ivan P., Shane O'Neill, Apostolico, Leonardo, Molloy, Kieran C., Rushworth, Simon

    Published in Chemistry of materials (01-07-2002)
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  7. 7
    Dual-source chemical vapour deposition of titanium(III) phosphide from titanium tetrachloride and tristrimethylsilylphosphine

    Dual-source chemical vapour deposition of titanium(III) phosphide from titanium tetrachloride and tristrimethylsilylphosphine by Blackman, Christopher S., Carmalt, Claire J., O’Neill, Shane A., Parkin, Ivan P., Apostolico, Leonardo, Molloy, Kieran C.

    Published in Applied surface science (30-04-2003)
    “…Thin films of titanium(III) phosphide (TiP) have been produced from the dual-source atmospheric pressure CVD reaction of TiCl 4 and…”
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