Search Results - "Anhar Uddin Bhuiyan, A F M"
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MOCVD homoepitaxy of Si-doped (010) β-Ga2O3 thin films with superior transport properties
Published in Applied physics letters (24-06-2019)“…Record-high electron mobilities were achieved for silicon-doped (010) β-Ga2O3 homoepitaxial films grown via metalorganic chemical vapor deposition (MOCVD). Key…”
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2
Mg acceptor doping in MOCVD (010) β-Ga2O3
Published in Applied physics letters (30-11-2020)“…In this Letter, in situ Mg doping in β-Ga2O3 was demonstrated via metalorganic chemical vapor deposition (MOCVD) epitaxy. The electrical insulating property of…”
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3
The role of carbon and C-H neutralization in MOCVD β-Ga2O3 using TMGa as precursor
Published in Applied physics letters (05-06-2023)“…In this Letter, the role of background carbon in metalorganic chemical vapor deposition (MOCVD) β-Ga2O3 growth using trimethylgallium (TMGa) as the Ga…”
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4
Probing Charge Transport and Background Doping in Metal‐Organic Chemical Vapor Deposition‐Grown (010) β‐Ga2O3
Published in Physica status solidi. PSS-RRL. Rapid research letters (01-08-2020)“…A new record‐high room‐temperature electron Hall mobility (μRT = 194 cm2 V−1 s−1 at n ≈ 8 × 1015 cm−3) for β‐Ga2O3 is demonstrated in the unintentionally doped…”
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5
β-Ga2O3 FinFETs with ultra-low hysteresis by plasma-free metal-assisted chemical etching
Published in Applied physics letters (01-08-2022)“…In this work, β-Ga2O3 fin field-effect transistors (FinFETs) with metalorganic chemical vapor deposition grown epitaxial Si-doped channel layer on (010)…”
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6
Vacuum annealed β-Ga2O3 recess channel MOSFETs with 8.56 kV Breakdown Voltage
Published in IEEE electron device letters (01-01-2022)“…This letter reports vacuum annealing of lateral field-plated β-Ga 2 O 3 MOSFETs with significant current recovery and improvement in the on-state resistance, R…”
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7
Electrostatic Engineering Using Extreme Permittivity Materials for Ultra-Wide Bandgap Semiconductor Transistors
Published in IEEE transactions on electron devices (01-01-2021)“…The performance of ultra-wide bandgap semiconductors like <inline-formula> <tex-math notation="LaTeX">{\beta } </tex-math></inline-formula>-Ga 2 O 3 is…”
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8
Planar and three-dimensional damage-free etching of β-Ga2O3 using atomic gallium flux
Published in Applied physics letters (20-09-2021)“…In situ etching using Ga flux in an ultra-high vacuum environment like molecular beam epitaxy is introduced as a method to make high aspect ratio…”
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9
Influence of growth temperature on defect states throughout the bandgap of MOCVD-grown β-Ga2O3
Published in Applied physics letters (26-10-2020)“…The influence of growth temperature on the distribution (concentrations and energy levels) of individual defect states in metal organic chemical vapor…”
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10
Temperature dependent characteristics of β-Ga2O3 FinFETs by MacEtch
Published in Applied physics letters (24-07-2023)“…Understanding the thermal stability and degradation mechanism of β-Ga2O3 metal-oxide-semiconductor field-effect transistors (MOSFETs) is crucial for their…”
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11
Tunable bandgap and Si-doping in N-polar AlGaN on C-face 4H-SiC via molecular beam epitaxy
Published in Applied physics letters (30-10-2023)“…N-polar AlGaN is an emerging wide-bandgap semiconductor for next-generation high electron mobility transistors and ultraviolet light emitting diodes and…”
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12
High-Mobility MOCVD β‑Ga2O3 Epitaxy with Fast Growth Rate Using Trimethylgallium
Published in Crystal growth & design (01-06-2022)“…In this work, metalorganic chemical vapor deposition (MOCVD) of (010) β-Ga2O3 with fast growth rates was investigated using trimethylgallium (TMGa) as the…”
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13
MOCVD epitaxy of β-(AlxGa1−x)2O3 thin films on (010) Ga2O3 substrates and N-type doping
Published in Applied physics letters (16-09-2019)“…(010) β-(AlxGa1−x)2O3 thin films were grown on (010) β-Ga2O3 substrates via metalorganic chemical vapor deposition with up to 40% Al incorporation by…”
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14
MOCVD growth of (010) β-(AlxGa1−x)2O3 thin films
Published in Journal of materials research (14-12-2021)“…In this work, we systematically investigate the effects of growth parameters on the structural and surface morphological properties of β-(Al x Ga 1− x ) 2 O 3…”
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15
Scaled β-Ga2O3 thin channel MOSFET with 5.4 MV/cm average breakdown field and near 50 GHz fMAX
Published in Applied physics letters (01-05-2023)“…This Letter reports a high performance β-Ga2O3 thin channel MOSFET with T gate and degenerately doped (n++) source/drain contacts regrown by metal organic…”
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16
Schottky diode characteristics on high-growth rate LPCVD β-Ga2O3 films on (010) and (001) Ga2O3 substrates
Published in Applied physics letters (21-03-2022)“…High crystalline quality thick β-Ga2O3 drift layers are essential for multi-kV vertical power devices. Low-pressure chemical vapor deposition (LPCVD) is…”
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17
MOCVD Growth of Thick β‑(Al)GaO Films with Fast Growth Rates
Published in Crystal growth & design (04-10-2023)“…In this work, we investigated the epitaxial growth of (010) β-Ga2O3 and β-(Al x Ga1–x )2O3 films using metalorganic chemical vapor deposition (MOCVD) with…”
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18
High growth rate metal organic chemical vapor deposition grown Ga2O3 (010) Schottky diodes
Published in Journal of vacuum science & technology. A, Vacuum, surfaces, and films (01-07-2024)“…We report on the growth of Si-doped homoepitaxial β-Ga2O3 thin films on (010) Ga2O3 substrates via metal-organic chemical vapor deposition (MOCVD) utilizing…”
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19
A combined approach of atom probe tomography and unsupervised machine learning to understand phase transformation in (AlxGa1−x)2O3
Published in Applied physics letters (13-04-2020)“…In this paper, we investigated the evolution of microstructural chemistry of metal organic chemical vapor deposition grown (010) (AlxGa1−x)2O3 films with…”
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20
Metalorganic chemical vapor deposition of (100) β-Ga2O3 on on-axis Ga2O3 substrates
Published in Journal of vacuum science & technology. A, Vacuum, surfaces, and films (01-12-2022)“…Metalorganic chemical vapor deposition (MOCVD) growths of β-Ga2O3 on on-axis (100) Ga2O3 substrates are comprehensively investigated. Key MOCVD growth…”
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