Inhomogeneous depth distribution of fluorine atoms in PVDF upon radiative carbonization

Under the action of ionizing radiation on a PVDF film, fluorine and hydrogen atoms bound to its linear carbon chain with single chemical bonds detach. Free atoms and HF molecules diffuse toward the film surface and escape from it. As a result of irradiation of the sample surface, a fluorine concentr...

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Bibliographic Details
Published in:	Surface investigation, x-ray, synchrotron and neutron techniques Vol. 7; no. 3; pp. 446 - 451
Main Authors:	Pesin, L. A., Andreichuk, V. P., Morilova, V. M., Gribov, I. V., Moskvina, N. A., Kuznetsov, V. L., Evsyukov, S. E., Koryakova, O. V., Mokrushin, A. D., Egorov, E. V.
Format:	Journal Article
Language:	English
Published:	Dordrecht SP MAIK Nauka/Interperiodica 01-05-2013
Subjects:	Chemistry and Materials Science Materials Science Surfaces and Interfaces Thin Films Neutron Technique Fluorine Atom PVDF Film Fluorine Rutherford Backscattering Spectroscopy
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Summary:	Under the action of ionizing radiation on a PVDF film, fluorine and hydrogen atoms bound to its linear carbon chain with single chemical bonds detach. Free atoms and HF molecules diffuse toward the film surface and escape from it. As a result of irradiation of the sample surface, a fluorine concentration depth profile arises. The fluorine distribution in the PVDF films subjected to long-term X-ray exposure was studied using X-ray photoelectron spectroscopy and Rutherford backscattering spectroscopy. Both methods yield close values of the fluorine concentration at a depth of ∼10 nm.
ISSN:	1027-4510 1819-7094
DOI:	10.1134/S1027451013030117