Search Results - "Amanatides, E."

Growth kinetics of plasma deposited microcrystalline silicon thin films by Amanatides, E., Mataras, D.

“…A continuum model for the nucleation and growth of microcrystalline silicon thin films from SiH4/H2 discharges is presented. The simulation considers mass…”
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Staphylococcus epidermidis adhesion to He, He/O2 plasma treated PET films and aged materials: Contributions of surface free energy and shear rate by Katsikogianni, M., Amanatides, E., Mataras, D., Missirlis, Y.F.

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Covalent immobilization of liposomes on plasma functionalized metallic surfaces by Mourtas, S., Kastellorizios, M., Klepetsanis, P., Farsari, E., Amanatides, E., Mataras, D., Pistillo, B.R., Favia, P., Sardella, E., d’Agostino, R., Antimisiaris, S.G.

“…[Display omitted] ▶ Liposomes are immobilized in intact form, by a stable amide bond on plasma treated metallic surfaces. ▶ Availability of –COOH– groups on…”
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Effect of substrate bias on the plasma enhanced chemical vapor deposition of microcrystalline silicon thin films by Zhang, X.D., Zhang, F.R., Amanatides, E., Mataras, D., Zhao, Y.

“…The effects of substrate bias voltage on the growth rate and structure of silicon thin films, deposited from highly diluted 13.56 MHz SiH 4/H 2 discharges at…”
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Plasma surface treatment of polyethylene terephthalate films for bacterial repellence by Amanatides, E., Mataras, D., Katsikogianni, M., Missirlis, Y.F.

“…An investigation of the effect of PET surface treatment in He/O 2 rf discharges on the bacterial ( Staphylococcus epidermidis) adhesion was performed. The…”
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Disilane as a growth rate catalyst of plasma deposited microcrystalline silicon thin films by Dimitrakellis, P., Kalampounias, A. G., Spiliopoulos, N., Amanatides, E., Mataras, D., Lahootun, V., Coeuret, F., Madec, A.

“…The effect of small disilane addition on the gas phase properties of silane-hydrogen plasmas and the microcrystalline silicon thin films growth is presented…”
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RF power effect on TEOS/O2 PECVD of silicon oxide thin films by Voulgaris, Ch, Panou, A., Amanatides, E., Mataras, D.

“…The effect of the RF power at two excitation frequencies (13.56 and 27.12 MHz), on the growth rate and on the chemical composition of the deposited SiO2 films…”
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Modeling and experiments of high-pressure VHF SiH4/H2 discharges for higher microcrystalline silicon deposition rate by ZHANG, X. D, ZHANG, F. R, AMANATIDES, E, MATARAS, D, ZHAO, Y

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Passive UHF RFID-Based Knitted Wearable Compression Sensor by Tajin, Md Abu Saleh, Amanatides, Chelsea E., Dion, Genevieve, Dandekar, Kapil R.

“…One of the major challenges faced by passive on-body wireless Internet-of-Things sensors is the absorption of radiated power by tissues in the human body. We…”
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Relative importance of hydrogen atom flux and ion bombardment to the growth of μc-Si:H thin films by Lyka, B., Amanatides, E., Mataras, D.

“…An investigation of the relative importance of H atoms and ions to the transition from amorphous to microcrystalline silicon growth was performed by applying…”
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Plasma emission diagnostics for the transition from microcrystalline to amorphous silicon solar cells by Amanatides, E., Mataras, D., Rapakoulias, D., van den Donker, M.N., Rech, B.

“…The possibility to employ spatially resolved optical emission spectroscopy (SROES) as a diagnostic tool for the prediction of the transition from…”
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Total SiH4/H2 pressure effect on microcrystalline silicon thin films growth and structure by KATSIA, E, AMANATIDES, E, MATARAS, D, SOTO, A, VOYIATZIS, G. A

“…The effect of the total SiH4/H2 gas pressure (1-10Torr) on the growth rate, the film crystallinity and the nature of hydrogen bonding of microcrystalline…”
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Electrical and optical properties of CH4/H2 RF plasmas for diamond-like thin film deposition by AMANATIDES, E, MATARAS, D

“…A study of the effect of the substrate bias potential on the electrical properties of CH4/H2 discharges used for depositing a-C:H thin films on polymeric…”
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RF power and SiOxCyHz deposition efficiency in TEOS/O2 discharges for the corrosion protection of magnesium alloys by VOULGARIS, Ch, AMANATIDES, E, MATARAS, D, GRASSINI, S, ANGELINI, E, ROSALBINO, F

“…The effect of the applied voltage of 27.12 MHz TEOS/O2/He discharges on the deposition process of SiOxCyHz thin films over rough as-cast Mg alloys was…”
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Temperature effect and stress on microcrystalline silicon thin films deposited under high pressure plasma conditions by Amanatides, E., Katsia, E., Mataras, D., Soto, A., Voyiatzis, G.A.

“…An investigation of the effect of the deposition pressure (133.3–1333 Pa) on the μc-Si:H crystallinity, stress and thermal stability was performed. The films…”
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Effect of plasma parameters on the amorphous to microcrystalline silicon transition by Katsia, E., Amanatides, E., Mataras, D., Rapakoulias, D.E.

“…A study of the role of the main plasma parameters on the transition from microcrystalline to amorphous silicon growth was performed, considering also the…”
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On the Effect of Sweat on Sheet Resistance of Knitted Conductive Yarns in Wearable Antenna Design by Tajin, Md Abu Saleh, Levitt, Ariana S., Liu, Yuqiao, Knittel, Chelsea E., Schauer, Caroline L., Dion, Genevieve, Dandekar, Kapil R.

“…Researchers are looking for new methods to integrate sensing capabilities into textiles while maintaining the durability, flexibility, and comfort of the…”
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Plasma 2D modeling and diagnostics of DLC deposition on PET by Amanatides, E., Gkotsis, P., Syndrevelis, Ch, Mataras, D.

“…The possibility to apply two dimensional (2D) emission spectra of short-lived excited species for estimating the uniformity of production of ions and radicals…”
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Diagnostics and mechanistic studies in plasma treatment of polyester textiles by Kostopoulou, M, Amanatides, E, Matarasp, D

“…The effect of low pressure He/02 plasma treatment on the desizing of polyester textiles was studied. Namely, the effect of the total gas pressure and of the…”
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Substrate holder biasing for improvement of microcrystalline silicon deposition process by Zhang, X.D., Zhang, F.R., Amanatides, E., Mataras, D., Xiong, S.Z., Zhao, Y.

“…Application of a dual frequency plasma source for the deposition of microcrystalline silicon thin films from highly diluted SiH4/H2 was investigated in this…”
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