Search Results - "Alty, Hayden R."

Plasma-Etched Pattern Transfer of Sub-10 nm Structures Using a Metal–Organic Resist and Helium Ion Beam Lithography by Lewis, Scott M, Hunt, Matthew S, DeRose, Guy A, Alty, Hayden R, Li, Jarvis, Wertheim, Alex, De Rose, Lucia, Timco, Grigore A, Scherer, Axel, Yeates, Stephen G, Winpenny, Richard E. P

“…Field-emission devices are promising candidates to replace silicon fin field-effect transistors as next-generation nanoelectronic components. For these devices…”
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Tuning the Performance of Negative Tone Electron Beam Resists for the Next Generation Lithography by Lewis, Scott M., DeRose, Guy A., Alty, Hayden R., Hunt, Matthew S., Lee, Nathan, Mann, James A., Grindell, Richard, Wertheim, Alex, De Rose, Lucia, Fernandez, Antonio, Muryn, Christopher A., Whitehead, George F. S., Timco, Grigore A., Scherer, Axel, Winpenny, Richard E. P.

“…A new class of electron bean negative tone resist materials has been developed based on heterometallic rings. The initial resist performance demonstrates a…”
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Nanoscale Patterning of Zinc Oxide from Zinc Acetate Using Electron Beam Lithography for the Preparation of Hard Lithographic Masks by Chaker, Ahmad, Alty, Hayden R, Tian, Peng, Kotsovinos, Anastasios, Timco, Grigore A, Muryn, Christopher A, Lewis, Scott M, Winpenny, Richard E. P

“…An approach is presented for nanoscale patterning of zinc oxide (ZnO) using electron beam (e-beam) lithography for future nanoelectronic devices and for hard…”
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Use of Supramolecular Assemblies as Lithographic Resists by Lewis, Scott M., Fernandez, Antonio, DeRose, Guy A., Hunt, Matthew S., Whitehead, George F. S., Lagzda, Agnese, Alty, Hayden R., Ferrando‐Soria, Jesus, Varey, Sarah, Kostopoulos, Andreas K., Schedin, Fredrik, Muryn, Christopher A., Timco, Grigore A., Scherer, Axel, Yeates, Stephen G., Winpenny, Richard E. P.

“…A new resist material for electron beam lithography has been created that is based on a supramolecular assembly. Initial studies revealed that with this…”
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Use of Supramolecular Assemblies as Lithographic Resists by Lewis, Scott M., Fernandez, Antonio, DeRose, Guy A., Hunt, Matthew S., Whitehead, George F. S., Lagzda, Agnese, Alty, Hayden R., Ferrando‐Soria, Jesus, Varey, Sarah, Kostopoulos, Andreas K., Schedin, Fredrik, Muryn, Christopher A., Timco, Grigore A., Scherer, Axel, Yeates, Stephen G., Winpenny, Richard E. P.

“…A new resist material for electron beam lithography has been created that is based on a supramolecular assembly. Initial studies revealed that with this…”
Get full text