Search Results - "Algots, J. Martin"

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    Compaction and rarefaction affect photolithography system lifetimes by J Martin Algots, Steinbrecher, Carl, Chuckravenan, Soupaya, Jinbo, Hiroki

    Published in Laser focus world (01-11-2005)
    “…Early development of 193-nm lithography was fueled by 10- and 20-W sources, but output powers of 40, 60, and eventually 90 W will likely be required to support…”
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