Search Results - "Alba, Pablo Acosta"

Defect Engineering for Enhanced Silicon Radiofrequency Substrates by Perrosé, Martin, Baron, Yoann, Lefaucher, Baptiste, Acosta Alba, Pablo, Raskin, Jean‐Pierre

“…Herein, high‐resistivity silicon substrates with specific He+ ion implantations to mitigate the parasitic surface conduction effect are studied. Several…”
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Solid phase recrystallization induced by multi-pulse nanosecond laser annealing by Acosta Alba, Pablo, Aubin, Joris, Perrot, Sylvain, Mazzamuto, Fulvio, Grenier, Adeline, Kerdilès, Sébastien

“…The solid phase recrystallization of partially amorphized SOI structures using a pulsed Ultra-Violet Nanosecond Laser Annealing (UV-NLA) is reported. It is…”
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Solid Phase Recrystallization in Arsenic Ion-Implanted Silicon-On-Insulator by Microsecond UV Laser Annealing by Tabata, Toshiyuki, Roze, Fabien, Acosta Alba, Pablo, Halty, Sebastien, Raynal, Pierre-Edouard, Karmous, Imen, Kerdiles, Sebastien, Mazzamuto, Fulvio

“…UV laser annealing (UV-LA) enables surface-localized high-temperature thermal processing to form abrupt junctions in emerging monolithically stacked devices,…”
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A differential Hall effect measurement method with sub-nanometre resolution for active dopant concentration profiling in ultrathin doped Si1− xGex and Si layers by Daubriac, Richard, Scheid, Emmanuel, Rizk Hiba, Monflier, Richard, Joblot Sylvain, Beneyton Rémi, Acosta, Alba Pablo, Kerdilès Sébastien, Filadelfo, Cristiano

“…In this paper, we present an enhanced differential Hall effect measurement method (DHE) for ultrathin Si and SiGe layers for the investigation of dopant…”
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Use of Nanosecond Laser Annealing for Thermally Stable Ni(GeSn) Alloys by Quintero, Andrea, Alba, Pablo Acosta, Hartmann, Jean-Michel, Cooper, David, Gergaud, Patrice, Reboud, Vincent, Rodriguez, Philippe

“…In this study, we have conclusively used UV-nanosecond laser annealing (UV-NLA) as an alternative to classical rapid thermal annealing (RTA) for the formation…”
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Multiscale modeling of ultrafast melting phenomena by Calogero, Gaetano, Raciti, Domenica, Acosta-Alba, Pablo, Cristiano, Fuccio, Deretzis, Ioannis, Fisicaro, Giuseppe, Huet, Karim, Kerdilès, Sébastien, Sciuto, Alberto, La Magna, Antonino

“…Ultraviolet Nanosecond Laser Annealing (LA) is a powerful tool for both fundamental investigations of ultrafast, nonequilibrium phase-change phenomena and…”
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Solid Phase Recrystallization in Arsenic Ion-Implanted Silicon-On-Insulator by Microsecond UV Laser Annealing by Tabata, Toshiyuki, Rozé, Fabien, Alba, Pablo Acosta, Halty, Sebastien, Raynal, Pierre-Edouard, Karmous, Imen, Kerdilés, Sébastien, Mazzamuto, Fulvio

“…UV laser annealing (UV-LA) enables surface-localized high-temperature thermal processing to form abrupt junctions in emerging monolithically stacked devices,…”
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Microsecond non-melt UV laser annealing for future 3D-stacked CMOS by Tabata, Toshiyuki, Rozé, Fabien, Thuries, Louis, Halty, Sebastien, Raynal, Pierre-Edouard, Huet, Karim, Mazzamuto, Fulvio, Joshi, Abhijeet, Basol, Bulent M, Alba, Pablo Acosta, Kerdilès, Sébastien

“…Three-dimensional (3D) CMOS technology encourages the use of UV laser annealing (UV-LA) because the shallow absorption of UV light into materials and the…”
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Atomistic Insights into Ultrafast SiGe Nanoprocessing by Calogero, Gaetano, Raciti, Domenica, Ricciarelli, Damiano, Acosta-Alba, Pablo, Cristiano, Fuccio, Daubriac, Richard, Demoulin, Remi, Deretzis, Ioannis, Fisicaro, Giuseppe, Hartmann, Jean-Michel, Kerdilès, Sébastien, La Magna, Antonino

“…Controlling ultrafast material transformations with atomic precision is essential for future nanotechnology. Pulsed laser annealing (LA), inducing extremely…”
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Investigation of oxygen penetration during UV nanosecond laser annealing of silicon at high energy densities by Monflier, R., Tabata, T., Rizk, H., Roul, J., Huet, K., Mazzamuto, F., Acosta Alba, P., Kerdilès, S., Boninelli, S., La Magna, A., Scheid, E., Cristiano, F., Bedel-Pereira, E.

“…[Display omitted] •Oxygen and carbon impurities diffusion during melt laser annealing.•Identification and localization of optical defects signatures.•Impact of…”
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Impact of surface reflectivity on the ultra-fast laser melting of silicon-germanium alloys by Ricciarelli, Damiano, Mannino, Giovanni, Deretzis, Ioannis, Calogero, Gaetano, Fisicaro, Giuseppe, Daubriac, Richard, Cristiano, Fuccio, Demoulin, Remi, Michałowski, Paweł P., Acosta-Alba, Pablo, Hartmann, Jean-Michel, Kerdilès, Sébastien, La Magna, Antonino

“…Ultraviolet nanosecond laser annealing (LA) is a powerful tool where strongly confined heating and melting are desirable. In semiconductor technologies the…”
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SiGe-enhanced Si capacitive modulator integration in a 300 mm silicon photonics platform for low power consumption by Douix, Maurin, Perez-Galacho, Diego, Charlet, Ismael, Baudot, Charles, Acosta-Alba, Pablo, Kerdilès, Sébastien, Euvrard, Catherine, Grosse, Philippe, Planchot, Jonathan, Blanc, Romuald, Beneyton, Rémi, Gourhant, Olivier, Crémer, Sébastien, Souhaité, Aurélie, Vulliet, Nathalie, Vivien, Laurent, Marris-Morini, Delphine, Boeuf, Frédéric

“…The successful integration of capacitive phase shifters featuring a p-type strained SiGe layer in a 300 mm silicon photonics platform is presented. The phase…”
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Low loss poly-silicon for high performance capacitive silicon modulators by Douix, Maurin, Baudot, Charles, Marris-Morini, Delphine, Valéry, Alexia, Fowler, Daivid, Acosta-Alba, Pablo, Kerdilès, Sébastien, Euvrard, Catherine, Blanc, Romuald, Beneyton, Rémi, Souhaité, Aurélie, Crémer, Sébastien, Vulliet, Nathalie, Vivien, Laurent, Boeuf, Frédéric

“…Optical properties of poly-silicon material are investigated to be integrated in new silicon photonics devices, such as capacitive modulators. Test structure…”
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Hyper-Doped Silicon Nanoantennas and Metasurfaces for Tunable Infrared Plasmonics by Poumirol, Jean-Marie, Majorel, Clément, Chery, Nicolas, Girard, Christian, Wiecha, Peter R, Mallet, Nicolas, Monflier, Richard, Larrieu, Guilhem, Cristiano, Filadelfo, Royet, Anne-Sophie, Alba, Pablo Acosta, Kerdiles, Sébastien, Paillard, Vincent, Bonafos, Caroline

“…We present the experimental realization of ordered arrays of hyper-doped silicon nanodisks, which exhibit a localized surface plasmon resonance. The plasmon is…”
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A differential Hall effect measurement method with sub-nanometre resolution for active dopant concentration profiling in ultrathin doped Si1-x Ge x and Si layers by Daubriac, Richard, Scheid, Emmanuel, Rizk, Hiba, Monflier, Richard, Joblot, Sylvain, Beneyton, Rémi, Acosta Alba, Pablo, Kerdilès, Sébastien, Cristiano, Filadelfo

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A differential Hall effect measurement method with sub-nanometre resolution for active dopant concentration profiling in ultrathin doped Si 1- x Ge x and Si layers by Daubriac, Richard, Scheid, Emmanuel, Rizk, Hiba, Monflier, Richard, Joblot, Sylvain, Beneyton, Rémi, Acosta Alba, Pablo, Kerdilès, Sébastien, Cristiano, Filadelfo

“…In this paper, we present an enhanced differential Hall effect measurement method (DHE) for ultrathin Si and SiGe layers for the investigation of dopant…”
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Undoped SiGe material calibration for numerical nanosecond laser annealing simulations by Royet, A-S., Dagault, L., Kerdiles, S., Alba, P. Acosta, Barnes, J.P, Cristiano, F., Huet, K.

“…Physical parameters calibration (dielectric and alloy properties) of Si 1-X Ge X alloys is presented in order to simulate the Ultra Violet-Nanosecond Laser…”
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Innovative Annealing Technology for Thermally Stable Ni(GeSn) Alloys by Quintero, Andrea, Alba, Pablo Acosta, Hartmann, Jean-Michel, Gergaud, Patrice, Reboud, Vincent, Rodriguez, Philippe

“…GeSn alloys are very promising materials for Si-based photonics and CMOS technologies. Performant contacts are definitely needed to make the most of innovative…”
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Impact of surface reflectivity on the ultra-fast laser melting of silicon-germanium alloys by Ricciarelli, Damiano, Mannino, Giovanni, Deretzis, Ioannis, Calogero, Gaetano, Fisicaro, Giuseppe, Daubriac, Richard, Demoulin, Remi, Cristiano, Fuccio, Michalowski, Pawel P, Acosta-Alba, Pablo, Hartmann, Jean-Michel, Kerdilès, Sébastien, La Magna, Antonino

“…Mat. Sci. Semicond. Proc. 165 (2023) 10765 Ultraviolet nanosecond laser annealing (LA) is a powerful tool where strongly confined heating and melting are…”
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Atomistic insights into ultrafast SiGe nanoprocessing by Calogero, Gaetano, Raciti, Domenica, Ricciarelli, Damiano, Acosta-Alba, Pablo, Cristiano, Fuccio, Daubriac, Richard, Demoulin, Remi, Deretzis, Ioannis, Fisicaro, Giuseppe, Hartmann, Jean-Michel, Kerdilès, Sébastien, La Magna, Antonino

“…Controlling ultrafast material transformations with atomic precision is essential for future nanotechnology. Pulsed laser annealing (LA), inducing extremely…”
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