Search Results - "Aidla, Aleks"

Atomic layer deposition of epitaxial HfO2 thin films on r-cut sapphire by Mändar, Hugo, Rammula, Raul, Aidla, Aleks, Aarik, Jaan

“…Textured epitaxial HfO2 thin films of monoclinic structure were grown on r-cut Al2O3 by atomic layer deposition from HfCl4 and H2O at temperatures 450–750 °C…”
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Atomic layer deposition of Ru films from bis(2,5-dimethylpyrrolyl)ruthenium and oxygen by Kukli, Kaupo, Aarik, Jaan, Aidla, Aleks, Jõgi, Indrek, Arroval, Tõnis, Lu, Jun, Sajavaara, Timo, Laitinen, Mikko, Kiisler, Alma-Asta, Ritala, Mikko, Leskelä, Markku, Peck, John, Natwora, Jim, Geary, Joan, Spohn, Ronald, Meiere, Scott, Thompson, David M.

“…Ru thin films were grown on hydrogen terminated Si, SiO2, Al2O3, HfO2, and TiO2 surfaces by atomic layer deposition from bis(2,5-dimethylpyrrolyl)ruthenium…”
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Titanium isopropoxide as a precursor for atomic layer deposition: characterization of titanium dioxide growth process by Aarik, Jaan, Aidla, Aleks, Uustare, Teet, Ritala, Mikko, Leskelä, Markku

“…Atomic layer deposition (ALD) of titanium oxide from titanium isopropoxide (Ti(OCH(CH 3) 2) 4) and water as well as from Ti(OCH(CH 3) 2) 4 and hydrogen…”
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Anomalous effect of temperature on atomic layer deposition of titanium dioxide by Aarik, Jaan, Aidla, Aleks, Mändar, Hugo, Sammelselg, Väino

“…A strong influence of growth temperature on the deposition rate and refractive index of TiO 2 thin films, grown by atomic layer deposition from TiCl 4 and H…”
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Atomic layer deposition of high capacitance density Ta2O5-ZrO2 based dielectrics for metal-insulator-metal structures by JOGI, Indrek, KUKLI, Kaupo, RITALA, Mikko, LESKELÄ, Markku, AARIK, Jaan, AIDLA, Aleks, JUN LU

“…The electrical properties of laminated atomic layer deposited films (ZrO2-Ta2O5, ZrO2-Nb2O5-Ta2O5, ZrO2-TaxNb1-xO5 and Ta2O5-ZrxNbyOz) were studied. Even…”
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Structure and morphology of Ru films grown by atomic layer deposition from 1-ethyl-1’-methyl-ruthenocene by Kukli, Kaupo, Aarik, Jaan, Aidla, Aleks, Uustare, Teet, Jõgi, Indrek, Lu, Jun, Tallarida, Massimo, Kemell, Marianna, Kiisler, Alma-Asta, Ritala, Mikko, Leskelä, Markku

“…Ru thin films were grown on TiO 2, Al 2O 3, HfO 2, and ZrO 2 films as well as on HF-etched silicon and SiO 2-covered silicon by atomic layer deposition from…”
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Effect of crystal structure on optical properties of TiO2 films grown by atomic layer deposition by Aarik, Jaan, Aidla, Aleks, Kiisler, Alma-Asta, Uustare, Teet, Sammelselg, Väino

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Growth kinetics and structure formation of ZrO2 thin films in chloride-based atomic layer deposition process by AARIK, Jaan, AIDLA, Aleks, MÄNDAR, Hugo, UUSTARE, Teet, SAMMELSELG, Väino

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Morphology and structure of TiO2 thin films grown by atomic layer deposition by AARIK, J, AIDLA, A, UUSTARE, T, SAMMELSELG, V

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Atomic layer deposition of TiO2 thin films from TiI4 and H2O by AARIK, Jaan, AIDLA, Aleks, UUSTARE, Teet, KUKLI, Kaupo, SAMMELSELG, Väino, RITALA, Mikko, LESKELÄ, Markku

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Atomic layer deposition of HfO2 on graphene from HfCl4 and H2O by Alles Harry, Aarik Jaan, Aidla Aleks, Fay Aurelien, Kozlova Jekaterina, Niilisk Ahti, Pärs Martti, Rähn Mihkel, Wiesner Maciej, Hakonen Pertti, Sammelselg Väino

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Atomic layer deposition of zirconium oxide from zirconium tetraiodide, water and hydrogen peroxide by Kukli, Kaupo, Forsgren, Katarina, Aarik, Jaan, Uustare, Teet, Aidla, Aleks, Niskanen, Antti, Ritala, Mikko, Leskelä, Markku, Hårsta, Anders

“…ZrO 2 films were grown on Si and SiO 2 substrates in the temperature range of 250–500°C using atomic layer deposition (ALD) technique. ZrI 4 and H 2O–H 2O 2…”
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Properties of tantalum oxide thin films grown by atomic layer deposition by Kukli, Kaupo, Aarik, Jaan, Aidla, Aleks, Kohan, Oksana, Uustare, Teet, Sammelselg, Väino

“…Thin tantalum oxide films were deposited using atomic layer deposition from TaCl 5 and H 2O at temperatures in the range 80–500 °C. The films deposited at…”
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Effect of growth conditions on formation of TiO2-II thin films in atomic layer deposition process by Aarik, Jaan, Aidla, Aleks, Sammelselg, Väino, Uustare, Teet

“…The role of precursor doses and purge times on the atomic layer deposition (ALD) of high-density α-PbO2-type TiO2 polymorph (TiO2-II) is studied. It has been…”
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Control of thin film structure by reactant pressure in atomic layer deposition of TiO2 by AARIK, J, AIDLA, A, SAMMELSELG, V, SIIMON, H, UUSTARE, T

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Mechanisms of suboxide growth and etching in atomic layer deposition of tantalum oxide from TaCl5 and H2O by AARIK, J, KUKLI, K, AIDLA, A, PUNG, L

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Chemical resistance of thin film materials based on metal oxides grown by atomic layer deposition by Sammelselg, Väino, Netšipailo, Ivan, Aidla, Aleks, Tarre, Aivar, Aarik, Lauri, Asari, Jelena, Ritslaid, Peeter, Aarik, Jaan

“…Etching rate of technologically important metal oxide thin films in hot sulphuric acid was investigated. The films of Al-, Ti-, Cr-, and Ta-oxides studied were…”
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Atomic layer deposition of epitaxial HfO 2 thin films on r -cut sapphire by Mändar, Hugo, Rammula, Raul, Aidla, Aleks, Aarik, Jaan

“…Textured epitaxial HfO 2 thin films of monoclinic structure were grown on r-cut Al 2 O 3 by atomic layer deposition from HfCl 4 and H 2 O at temperatures…”
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Atomic layer deposition of epitaxial HfO sub(2) thin films on r-cut sapphire by Maendar, Hugo, Rammula, Raul, Aidla, Aleks, Aarik, Jaan

“…Textured epitaxial HfO2 thin films of monoclinic structure were grown on r-cut Al2O3 by atomic layer deposition from HfCl4 and H2O at temperatures 450750 DGC…”
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Influence of process parameters on atomic layer deposition of ZrO2 thin films from CpZr(NMe2)3 and H2O by Aarik, Lauri, Alles, Harry, Aidla, Aleks, Kahro, Tauno, Kukli, Kaupo, Niinistö, Jaakko, Mändar, Hugo, Tamm, Aile, Rammula, Raul, Sammelselg, Väino, Aarik, Jaan

“…Atomic layer deposition of ZrO2 films from tris(dimethylamino)cyclopentadienylzirconium CpZr(NMe2)3 and H2O, was investigated using real-time characterization…”
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