Deep Subwavelength Anti-slot Photonic Crystals Fabricated in Monolithic Silicon Photonics Technology

We report the scalable fabrication and characterization of photonic crystal (PhC) nanobeam waveguides incorporating subwavelength-scale dielectric anti-slot unit cells. These anti-slot PhCs were fabricated using deep UV lithography on a monolithic silicon photonics technology. The dielectric band ed...

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Bibliographic Details
Published in:	IEEE photonics technology letters Vol. 35; no. 9; p. 1
Main Authors:	Allen, J. A., Arnold, K. P., Halimi, S. I., Ryder, L. D., Afzal, F. O., Bian, Y., Aboketaf, A., Dezfulian, K., Rakowski, M., Augur, R., Hirokawa, T., Nummy, K., Weiss, S. M.
Format:	Journal Article
Language:	English
Published:	New York IEEE 01-05-2023 The Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subjects:	Dielectric strength Dielectrics Lithography monolithic fabrication nanophotonics Nanoscale devices Optical waveguides Photonic crystals Photonics Silicon Silicon devices Silicon photonics UV lithography Waveguides
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Summary:	We report the scalable fabrication and characterization of photonic crystal (PhC) nanobeam waveguides incorporating subwavelength-scale dielectric anti-slot unit cells. These anti-slot PhCs were fabricated using deep UV lithography on a monolithic silicon photonics technology. The dielectric band edge mode is characterized by strong field localization in the anti-slot region where the minimum dielectric feature size is approximately 70 nm. This demonstration opens the door to further investigation of subwavelength engineered photonic structures fabricated using commercial foundry processes for integrated photonics applications that benefit from enhanced light-matter interaction.
ISSN:	1041-1135 1941-0174
DOI:	10.1109/LPT.2023.3255821