Search Results - "ANDERS, André"

A structure zone diagram including plasma-based deposition and ion etching by Anders, André

“…An extended structure zone diagram is proposed that includes energetic deposition, characterized by a large flux of ions typical for deposition by filtered…”
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A review comparing cathodic arcs and high power impulse magnetron sputtering (HiPIMS) by Anders, André

“…High power impulse magnetron sputtering (HiPIMS) has been at the center of attention over the last years as it is an emerging physical vapor deposition (PVD)…”
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Localized heating of electrons in ionization zones: Going beyond the Penning-Thornton paradigm in magnetron sputtering by Anders, André

“…The fundamental question of how energy is supplied to a magnetron discharge is commonly answered by the Penning-Thornton paradigm invoking secondary electrons…”
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Discharge physics of high power impulse magnetron sputtering by Anders, André

“…High power impulse magnetron sputtering (HIPIMS) is pulsed sputtering where the peak power exceeds the time-averaged power by typically two orders of…”
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Self-organization and self-limitation in high power impulse magnetron sputtering by Anders, André

“…The plasma over the racetrack in high power impulse magnetron sputtering develops in traveling ionization zones. Power densities can locally reach 10 9 W/m 2 ,…”
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Deposition rates of high power impulse magnetron sputtering: Physics and economics by Anders, André

“…Deposition by high power impulse magnetron sputtering (HIPIMS) is considered by some as the new paradigm of advanced sputtering technology, yet this is met…”
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Direct observation of spoke evolution in magnetron sputtering by Anders, André, Yang, Yuchen

“…Ionization zones, also known as spokes, are plasma instabilities manifested as locations of intensified excitation and ionization over a sputtering magnetron's…”
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Self-sputtering runaway in high power impulse magnetron sputtering:The role of secondary electrons and multiply charged metal ions by Anders, André

“…Self-sputtering runaway in high power impulse magnetron sputtering is closely related to the appearance of multiply charged ions. This conclusion is based on…”
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High power impulse magnetron sputtering and related discharges: Scalable plasma sources for plasma-based ion implantation and deposition by Anders, André

“…High power impulse magnetron sputtering (HIPIMS) and related self-sputtering techniques are reviewed from a viewpoint of plasma-based ion implantation and…”
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Room Temperature Oxide Deposition Approach to Fully Transparent, All-Oxide Thin-Film Transistors by Rembert, Thomas, Battaglia, Corsin, Anders, André, Javey, Ali

“…A room temperature cathodic arc deposition technique is used to produce high‐mobility ZnO thin films for low voltage thin‐film transistors (TFTs) and digital…”
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Properties of secondary ions in ion beam sputtering of Ga2O3 by Kalanov, Dmitry, Anders, André, Bundesmann, Carsten

“…The energy distributions of secondary ions for the ion beam sputtering of a Ga 2O 3 target using O 2 + and Ar + ions are measured in dependence on various…”
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Ion beam sputtering of silicon: Energy distributions of sputtered and scattered ions by Kalanov, Dmitry, Anders, André, Bundesmann, Carsten

“…The properties of sputtered and scattered ions are studied for ion beam sputtering of Si by bombardment with noble gas ions. The energy distributions in…”
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Reduced atomic shadowing in HiPIMS: Role of the thermalized metal ions by Oliveira, João Carlos, Ferreira, Fábio, Anders, André, Cavaleiro, Albano

“…•Cr thin films were deposited by DCMS and HiPIMS in DOMS mode.•Anisotropic film was deposited by DCMS due to substrate rotation.•DOMS allows overcoming the…”
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Self-sputtering far above the runaway threshold: an extraordinary metal-ion generator by Andersson, Joakim, Anders, André

“…When self-sputtering is driven far above the runaway threshold voltage, energetic electrons are made available to produce "excess plasma" far from the…”
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Propagation direction reversal of ionization zones in the transition between high and low current magnetron sputtering by Yang, Yuchen, Liu, Jason, Liu, Lin, Anders, André

“…Past research has revealed the propagation of dense, asymmetric ionization zones in both high and low current magnetron discharges. Here, we report about the…”
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Gasless sputtering: Opportunities for ultraclean metallization, coatings in space, and propulsion by Andersson, Joakim, Anders, André

“…Pulsed magnetron sputtering was demonstrated in high vacuum: no sputter gas was used at any time. Sustained self-sputtering was initiated by multiply charged…”
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Plasma and ion sources in large area coating: A review by Anders, André

“…Efficient deposition of high-quality coatings often requires controlled application of excited or ionized particles. These particles are either condensing…”
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Properties of secondary particles for ion beam sputtering of silicon using low-energy oxygen ions by Oh, Kyunghwan, Kalanov, Dmitry, Anders, André, Bundesmann, Carsten

“…The properties of secondary particles for sputtering silicon with primary low-energy oxygen ions were investigated with dependence on the primary ion energy…”
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Ion energies in high power impulse magnetron sputtering with and without localized ionization zones by Yang, Yuchen, Tanaka, Koichi, Liu, Jason, Anders, André

“…High speed imaging of high power impulse magnetron sputtering discharges has revealed that ionization is localized in moving ionization zones but localization…”
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Time- and Position-Dependent Breakdown Volume Calculations to Explain Experimentally Observed Femtosecond Laser-Induced Plasma Properties by Hossain, Afaque M., Ehrhardt, Martin, Rudolph, Martin, Lorenz, Pierre, Kalanov, Dmitry, Zimmer, Klaus, Anders, André

“…Focusing of femtosecond laser pulses in gases can produce different gas breakdown phenomena depending on the focusing conditions: from simple optical breakdown…”
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