Carbon based conductive photoresist

Carbon based conductive photoresist

A conductive photoresist for photolithographic application was studied here. The negative near-UV sensitive epoxy-based photoresist was used as a polymer matrix and conductive carbon black was used as functional filler. DC electrical resistivity of composite as a function of filler concentration has...

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Bibliographic Details
Published in:Journal of materials science Vol. 44; no. 17; pp. 4625 - 4632
Main Authors: Hauptman, Nina, Žveglič, Maša, Maček, Marijan, Klanjšek Gunde, Marta
Format: Journal Article
Language:English
Published: New York Springer US 01-09-2009
Springer Nature B.V
Subjects:
Additives
Carbon
Carbon black
Carbon fiber reinforced plastics
Characterization and Evaluation of Materials
Chemistry and Materials Science
Classical Mechanics
Crosslinking
Crystallography and Scattering Methods
Dispersions
Electrical resistivity
Exposure
Fillers
Materials Science
Particulate composites
Percolation
Photolithography
Photoresists
Polymer Sciences
Solid Mechanics
Spin coating
Percolation Threshold
Glycidyl Ether
Filler Concentration
Conductive Polymer Composite
Conductive Filler
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Summary:A conductive photoresist for photolithographic application was studied here. The negative near-UV sensitive epoxy-based photoresist was used as a polymer matrix and conductive carbon black was used as functional filler. DC electrical resistivity of composite as a function of filler concentration has a well-known S-shape. After UV-exposure the resistivity of the composite decreases for almost five orders of magnitude, mostly at percolation threshold (approx. 0.6 vol.%). This effect can be attributed to the fully cross-linked polymer structure formed during UV-exposure of the composite. The resistivity of prepared samples also depend on the state of dispersion of the functional filler obtained using different dispersing additives. Composites with better dispersed particles have lower resistivities. This effect remained below one order of magnitude and decreased after UV-exposure. The composites with carbon black concentration of up to 1.1 vol.% are suitable for spin-coating and photolithography.
Bibliography:ObjectType-Article-2
SourceType-Scholarly Journals-1
ObjectType-Feature-1
content type line 23
ISSN:0022-2461
1573-4803
DOI:10.1007/s10853-009-3706-2